Illumination system of a microlithographic projection device and method for operating such a system

An illumination system having an image plane and first and second object planes, the image plane being configured so that a mask is arrangeable in the image plane, each of the first and second object planes being optically conjugated to the image plane, the illumination system comprising:

• a first illumination optical unit configured to illuminate the first object plane with first projection light so that the first projection light has a first illumination angle distribution in the image plane, the first illumination optical unit comprising an optical integrator arranged in the light path of the first projection light only;
• and
• a second illumination optical unit configured to illuminate the second object plane with second projection light so that the second projection light has a second illumination angle distribution in the image plane,
• wherein:
• the second illumination angle distribution is from the first illumination angle distribution;
• the second illumination optical unit is configured to produce an intensity distribution on the second object plane;
• the intensity distribution on the second object plane moves synchronously with the mask along a displacement direction parallel to the second object plane;
• the illumination system is a microlithographic illumination system;
• the illumination system further comprises a first spatial light modulator comprising a modulator surface in the second object plane;
• and
• the illumination system is configured so that a modulation pattern that changes synchronously with the movement of the mask is producible on the modulator surface.

A method for operating an illumination system of a microlithographic projection apparatus, the method comprising:

• a) illuminating a first object plane, which is optically conjugated to the image plane, with first projection light so that the first projection light has a first illumination angle distribution in the image plane;
• b) illuminating a second object plane, which differs from the first object plane and which is likewise optically conjugated to the image plane, with second projection light so that the second projection light has a second illumination angle distribution in the image plane, the second illumination angle distribution differing from the first illumination angle distribution;
• and
• c) overlaying an image of the first object plane and an image of the second object plane in the image plane,
• wherein:
• the first projection light in a) is incident on an optical integrator that is arranged in the light path of the first projection light only;
• a mask is present in the image plane;
• the method further comprises:
• d) using a projection lens to image at least a portion of the illuminated mask onto a photoresist;
• an inhomogeneous intensity distribution is produced on the second object plane;
• the inhomogeneous intensity distribution in the second object plane depends on a pattern supported by the mask;
• and
• the inhomogeneous intensity distribution in the second object plane moves synchronously with a mask along the displacement direction parallel to the second object plane.