Developing method

A developing method for performing development to a substrate, the developing method comprising:

• a developing step of performing a developing process to a substrate rotating around the center thereof by feeding developer to the substrate;
• a dispensation starting step of starting dispensation of a surfactant rinse liquid from a surfactant rinse nozzle to a position, away from the center of the substrate on the rotating substrate, after the developing step such that the center of the substrate does not enter into a reaching region of the substrate where the surfactant rinse liquid dispensed from the surfactant rinse nozzle firstly reaches;
• a covering step of covering the center of the substrate with spread of the surfactant rinse liquid having reached the substrate immediately after the surfactant rinse liquid reaches the substrate;
• and
• a shifting step of shifting the reaching region of the surfactant rinse liquid within an area such that the spread of the surfactant rinse liquid having reached the substrate is not away from the center of the substrate after the spread of the surfactant rinse liquid covers the center of the substrate.