Coating compositions suitable for use with an overcoated photoresist
AssigneeRohm and Haas Electronic Materials LLC
InventorsJames F. Cameron, Jin Wuk Sung, John P. Amara, Gregory P. Prokopowicz, David A. Valeri
Life of this patent
Estimating the term…
Abstract
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
Claims9
A coated substrate comprising:
- (a) a coating composition layer comprising a resin, the resin comprising a reaction product of an imide-containing dienophile and a polycyclic aromatic group;
- and
- (b) a photoresist layer over the coating composition layer.
A method for forming a photoresist relief image comprising:
- (a) applying over a substrate a coating layer of a composition comprising a resin, the resin comprising a reaction product produced from reagents comprising an imide-containing dienophile and a polycyclic aromatic group;
- (b) applying a photoresist layer above the coating composition layer.
An antireflective composition for use with an overcoated photoresist, the antireflective composition comprising:
- a resin comprising a reaction product of reagents comprising (1) a dienophile and (2) a compound comprising a pentacene group;
- and
- an acid or acid generator compound.
Dependencies are inferred from the claim text.