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US 10,539,870 B2Granted
Photoresists comprising carbamate component
AssigneeRohm and Haas Electronic Materials LLC
InventorsWilliam Williams, III, Cong Liu, Cheng-Bai Xu
Life of this patent
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Abstract
New photoresist compositions are provided that comprise a carbamate compound that comprises 1) a carbamate group and 2) an ester group. Preferred photoresists of the invention may comprise a resin with acid-labile groups; an acid generator compound; and a carbamate compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.
Claims24
A photoresist composition comprising:
- (a) a resin;
- (b) an acid generator;
- and
- (c) a non-polymeric carbamate compound that comprises i) a carbamate group and ii) an ester group,
- wherein the carbamate compound corresponds to a structure of the following Formula I:
- wherein:
- R1 and R2 are each the same or different non-hydrogen substituent;
- L1 is a linker group that comprises at least one carbon atom;
- L2 is a non-hydrogen substituent;
- and wherein:
- L2 and R2 may be optionally taken together to form a ring structure;
- L1 and L2 may be optionally taken together to form a ring structure;
- R1 and L1 or R1 and L2 may be optionally taken together to form a ring structure;
- and
- both of R1 and R2 comprises an acid-labile moiety.
12 more elements
A photoresist composition comprising:
- (a) a resin;
- (b) an acid generator;
- and
- (c) a carbamate compound that comprises a structure of the following Formulae IB or IC:
- wherein in each of Formulae IB and IC, R1 and R2 are each the same or different non-hydrogen substituent;
- and
- L3 contains 1 to 16 carbon or hetero atoms.
4 more elements
A photoresist composition comprising:
- (a) a resin;
- (b) an acid generator;
- and
- (c) a non-polymeric carbamate compound that comprises i) a carbamate group and ii) an ester group,
- wherein the carbamate compound corresponds to a structure of the following Formula I:
- wherein:
- R1 and R2 are each the same or different non-hydrogen substituent;
- L1 is a linker group that comprises at least one carbon atom;
- L2 is a non-hydrogen substituent;
- and wherein at least one of R1 and R2 comprises an acid-labile moiety, and at least one of R1 and R2 comprises an acetal or ketal group.
7 more elements
A photoresist composition comprising:
- (a) a resin;
- (b) an acid generator;
- and
- (c) a non-polymeric carbamate compound that comprises i) a carbamate group and ii) an ester group;
- wherein the carbamate compound corresponds to a structure of the following Formula I:
- wherein:
- R1 and R2 are each the same or different non-hydrogen substituent;
- L1 is a linker group that comprises at least one carbon atom;
- L2 is a non-hydrogen substituent;
- and wherein:
- L2 and R2 are taken together to form a ring structure;
- L1 and L2 may be optionally taken together to form a ring structure;
- R1 and L1 or R1 and L2 may be optionally taken together to form a ring structure;
- and
- at least one of R1 and R2 comprises an acid-labile moiety.
12 more elements
Dependencies are inferred from the claim text.