Compensating method and system for cell assembly
AssigneesBoe Technology Group Co., Ltd., Ordos Yuansheng Optoelectronics Co., Ltd.
InventorsXiaohua Zhang, Xiahong Bai, Dong Yan, Hao Lei
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Abstract
The present disclosure relates to compensating method for cell assembly. According to a deviation value of a key position of a measured array substrate, a compensation value of an exposure parameter of black matrix process of a color film substrate is calculated in real time by using historical measurement data of batches. The compensation value is fed back to a manufacturing apparatus in real time. The manufacturing apparatus corrects the key parameter of the apparatus timely according to the compensation value of the exposure parameter of the black matrix, to manufacture a color film substrate matching with the array substrate.
Claims20
A compensating method for cell assembly of a first substrate and a second substrate, wherein a black matrix is provided on the second substrate, the method comprising:
- acquiring, by a data acquiring unit of a compensating apparatus, identification data and measurement data of the first substrate and the second substrate of each batch, wherein the measurement data comprises a deviation value of a key position of the first substrate of each batch, a deviation value of a key position of the second substrate of each batch, a deviation value of a key position of the black matrix on the second substrate of each batch, and a measurement value of alignment precision after alignment of the first substrate and the second substrate;
- calculating, by a controller of the compensating apparatus, the acquired measurement data and determining, by the controller of the compensating apparatus, a compensation value of an exposure parameter of the black matrix on the second substrate to be manufactured;
- and
- preparing, by an exposure apparatus, the second substrate to be manufactured by using an exposure parameter compensated by the compensation value of the exposure parameter.
A compensating system for cell assembly, comprising:
- a data acquiring circuit, a data analyzing circuit and a data applying circuit,
- wherein the data acquiring circuit is configured to acquire identification data and measurement data of the first substrate and the second substrate of each batch, wherein the measurement data comprises a deviation value of a key position of the first substrate of each batch, a deviation value of a key position of the second substrate of each batch, a deviation value of a key position of the black matrix on the second substrate of each batch, and a measurement value of alignment precision after alignment of the first substrate and the second substrate;
- the data analyzing circuit is configured to calculate the measurement data acquired by the data acquiring circuit and determining a compensation value of an exposure parameter of the black matrix on the second substrate to be manufactured;
- and
- the data applying circuit is configured to prepare the second substrate to be manufactured by using an exposure parameter compensated by the compensation value of the exposure parameter.
Dependencies are inferred from the claim text.