Electrolytic copper plating bath compositions and a method for their use
AssigneeAtotech Deutschland GmbH
InventorsHeiko Brunner, Dirk Rohde, Manuel Pölleth, Sven Rückbrod, Desthree Darwin, Sandra Niemann, Gerhard Steinberger
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Abstract
The present invention relates to aqueous acidic plating baths for copper and copper alloy deposition in the manufacture of printed circuit boards, IC substrates, semiconducting and glass devices for electronic applications. The plating bath according to the present invention comprises at least one source of copper ions, at least one acid and at least one guanidine compound. The plating bath is particularly useful for plating recessed structures with copper and build-up of copper pillar bump structures.
Claims20
An aqueous acidic copper plating bath for deposition of copper or copper alloys comprising at least one source of copper ions, at least one acid, and at least one guanidine compound which contains at least one unit according to formula (I)
- A-Da (I)
- wherein a is an integer ranging from 1 to 40 and A represents a unit derived from a monomer according to the following formulae (A1) and/or (A2)
- wherein
- Y and Y′ are each individually selected from the group consisting of CH2, O and S;
- R1 is an organic residue selected from the group consisting of hydrogen, alkyl, aryl and alkaryl;
- R2 is an organic residue selected from the group consisting of hydrogen, alkyl, aryl and alkaryl;
- R3, R4, R5 and R6 are each organic residues independently from each other selected from the group consisting of hydrogen, alkyl, aryl and alkaryl;
- b and b′ are integers each individually and independently from each other ranging from 0 to 6;
- c and c′ are integers each individually and independently from each other ranging from 1 to 6;
- d and d′ are integers each individually and independently from each other ranging from 0 to 6;
- e and e′ are integers each individually and independently from each other ranging from 0 to 6;
- D is a divalent residue and is selected from the group consisting of
- —Z1—[Z2—O]g—Z3—, —[Z4—O]h—Z5—, and —CH2—CH(OH)—Z6—[Z7—O]i—Z8—CH(OH)—CH2—;
- wherein
- Z1 is an alkylene group with 1 to 6 carbon atoms;
- Z2 is selected from the group consisting of alkylene group with 1 to 6 carbon atoms, aryl-substituted alkylene groups whereby the alkylene group comprises 1 to 6 carbon atoms and mixtures of the aforementioned;
- Z3 is an alkylene group with 1 to 3 carbon atoms;
- Z4 is selected from the group consisting of alkylene group with 1 to 6 carbon atoms, aryl-substituted alkylene groups whereby the alkylene group comprises 1 to 6 carbon atoms and mixtures of the aforementioned;
- Z5 is an alkylene group with 1 to 3 carbon atoms;
- Z6 is an alkylene group with 1 to 6 carbon atoms;
- Z7 is selected from the group consisting of alkylene group with 1 to 6 carbon atoms, aryl-substituted alkylene groups whereby the alkylene group comprises 1 to 6 carbon atoms and mixtures of the aforementioned;
- Z8 is an alkylene group with 1 to 3 carbon atoms;
- g is an integer ranging from 1 to 100;
- h is an integer ranging from 1 to 100;
- i is an integer ranging from 1 to 100;
- and
- wherein the individual units A are selected independently from each other, and the individual units D are selected independently from each other and the guanidine compound is linear and/or cross-linked, and
- wherein the bath is free of intentionally added zinc ions.
Dependencies are inferred from the claim text.