Method for film deposition and apparatus for performing said method

Method for depositing film on a substrate through pulsed laser deposition, the method comprising:

• generating N pulsed laser beams with at least one laser, with N>1;
• directing the laser beams to different target spots of a target, whereby the target is ablated to create at least two plasma plumes,
• wherein the plasma plumes create a flow of target material towards the substrate and the target material is deposited onto the substrate at a deposition area,
• wherein the plasma plumes created by the laser beams are superimposed both spatially and temporally, and
• wherein centers of the target spots are separated from each other by a distance that allows generation of a gas-dynamical interaction of the superimposed plasma plumes, wherein a total quantity of the target material deposited onto the substrate in the presence of the gas dynamical-interaction exceeds by a factor of up to three a total quantity of target material deposited onto the substrate when the plasma plumes do not generate a gas-dynamical interaction.