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US 10,538,056 B2Granted
Assembly structure, method to form assembly structure and method to form close-loop sealant structure
AssigneeHimax Display, Inc.
InventorPo-Hung Pan
Life of this patent
Estimating the term…
Abstract
An assembly structure is provided. A first material layer is disposed on a substrate. A hydrophobic layer is chemically attached to the first material layer. A patterned second material layer is disposed on the substrate, without the hydrophobic or slightly chemically attached with hydrophobic molecules and surrounded by the first material layer. A close-loop sealant wall is directly disposed on the patterned second material layer. A cover layer is directly disposed on the close-loop sealant wall to entirely cover the close-loop sealant wall.
Claims7
An assembly structure, comprising:
- an element disposed on and in direct contact with a substrate;
- a first material layer disposed on said substrate and in direct contact with said element;
- a hydrophobic layer chemically attached to said first material layer to modify the surface energy of said first material layer;
- a patterned second material layer disposed on said substrate and surrounded by said first material layer, wherein said first material layer is different from said patterned second material layer;
- a close-loop sealant wall directly disposed on and self-align with said patterned second material layer and a bottom of said close-loop sealant wall directly and partially covering a top surface of said patterned second material layer;
- said close-loop sealant, said cover layer and said patterned second material layer together to define an empty sealed space;
- and a cover layer in direct contact with a top surface of said close-loop sealant wall to entirely cover said close-loop sealant wall, wherein said close-loop sealant wall is in a form of a box.
4 more elements
Dependencies are inferred from the claim text.