# US 10,535,503 B2 · Hollow cathode plasma source

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- Number: US 10,535,503 B2
- Document ID: US10535503B2
- Status: Granted
- Kind: B2
- Application number: 15/532,855
- Filed: 2014-12-05
- Published: 2018-01-25
- Granted: 2020-01-14
- Earliest claimed: 2014-12-05
- Assignees: Agc Glass Europe; Agc Flat Glass North America, Inc.; Asahi Glass Company, Limited
- Applicants: Agc Glass Europe, S.A.; Agc Flat Glass North America, Inc.; Asahi Glass Co., Ltd.
- Inventors: Thomas Biquet; Peter Maschwitz; John Chambers; Hughes Wiame
- Web page: https://patentgrep.com/patent/US10535503B2

## CPC

- H01J 37/32541: {Shape}
- C23C 16/455: characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C 16/50: using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)}
- H01J 37/3244: {Gas supply means}
- H01J 37/32568: {Relative arrangement or disposition of electrodes; moving means}
- H01J 37/32596: {Hollow cathodes}
- H05H 1/46: using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence)
- H05H 1/48: using an arc (H05H1/26 takes precedence)
- H01J 2237/3321: CVD [Chemical Vapor Deposition]
- H01J 2237/3325: large area
- H05H 2001/466
- H05H 2240/10: at atmospheric pressure
- H05H 2245/1235
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- H05H: PLASMA TECHNIQUE (apparatus or processes specially adapted for producing X-rays H05G2/00); PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS

## Abstract

The present invention relates to a hollow cathode plasma source and to methods for surface treating or coating using such a plasma source, comprising first and second electrodes (1, 2), each electrode comprising an elongated cavity (4), wherein dimensions for at least one of the following parameters is selected so as to ensure high electron density and/or low amount of sputtering of plasma source cavity surfaces, those parameters being cavity cross section shape, cavity cross section area cavity distance (11), and outlet nozzle width (12).

## Claims

### Claim 1

A hollow cathode plasma source comprising a first electrode and a second electrode each electrode comprising an elongated cavity,
wherein the electrodes extend substantially parallel to each other,
wherein the first and second electrodes are both provided with a gas inlet for a plasma forming gas and with a gas outlet which leads to an outlet nozzle which is directed towards a substrate,
wherein first and second electrodes are electrically connected to a power source supplying the electrodes with alternatingly opposing voltages, and
wherein the following parameter's dimension are selected
i. the cavity cross section is of rectangular, rounded rectangular or circular shape or of a shape intermediary of these shapes,
ii. the cavity cross section area is comprised between 500 mm2 and 4000 mm2,
iii. the cavity distance is comprised between 85 mm and 160 mm, and
iv. the outlet nozzle width is comprised between 1 mm and 25 mm.

### Claim 2 (depends on 1)

The hollow cathode plasma source according to claim 1, wherein the cavity cross section shape is circular.

### Claim 3 (depends on 1)

The hollow cathode plasma source according to claim 1, wherein the cavity cross section area is comprised between 500 mm2 and 1000 mm2.

### Claim 4 (depends on 1)

The hollow cathode plasma source according to claim 1, wherein the cavity cross section area is comprised between 1000 mm2 and 4000 mm2.

### Claim 5 (depends on 1)

The hollow cathode plasma source according to claim 1, wherein the cavity cross section area is comprised between 750 mm2 and 1500 mm2.

### Claim 6 (depends on 1)

The hollow cathode plasma source according to claim 1, wherein the cavity distance is comprised between 100 mm and 145 mm.

### Claim 7 (depends on 1)

The hollow cathode plasma source according to claim 1, wherein the outlet nozzle width is comprised between 3.5 mm and 25 mm.