Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, electronic device, compound, and method for producing compound

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• an alkali-soluble resin;
• a crosslinking agent;
• and
• a compound capable of generating an acid upon irradiation with actinic rays or radiation,
• wherein the crosslinking agent is represented by the following General Formula (I),
• wherein in General Formula (I),
• each of R1 and R6 independently represents a hydrocarbon group having 5 or less carbon atoms,
• each of R2 and R5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group,
• R3 and R4 are bonded to each other to form a ring which is an aromatic or non-aromatic hydrocarbon ring, an aromatic or non-aromatic heterocyclic ring, or a polycyclic fused ring formed by a combination of two or more rings thereof,
• the ring formed by R3 and R4 may have a substituent which is at least one selected from the group consisting of an alkyl group, a cycloalkyl group, an alkoxy group, a carboxyl group, an aryl group, an acyl group, an alkoxycarbonyl group, a nitro group, halogen, and a hydroxy group, the alkali-soluble resin includes a repeating unit represented by the following General Formula (4),
• wherein in General Formula (4),
• R13 represents a hydrogen atom or a methyl group,
• Y represents a single bond or a divalent linking group, and
• X2 represents a non-acid-decomposable hydrocarbon group, the hydrocarbon group being a chain-like or branched hydrocarbon group, a phenyl group, or a naphthyl group, and
• the content of the cross-linking agent is 10 mass% or more based on the solids content of the actinic ray-sensitive or radiation-sensitive.