Suit pattern and measuring device for suit pattern
AssigneeYpsilon Japan Co., Ltd.
InventorYukihiko Funabashi
Life of this patent
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AssigneeYpsilon Japan Co., Ltd.
InventorYukihiko Funabashi
Estimating the term…
A suit pattern contains: setting, as left and right shoulder rear virtual base points, points specified by moving forward from the center line of the back region by a length that is one-half the circumference of the chest multiplied by 0.177±0.005, and then moving upward perpendicularly from that point approximately one-fourth of the length of the movement length; setting as left and right shoulder front-rear virtual base points, points specified according to the intersection of a line perpendicular to a position that is 0.56±0.05 times the length from the front body front-end edge to the front-end edge of the sleeve hole, and absolute horizontal line from the left or right shoulder front-rear base point; setting as left and right front-rear virtual base points and the cut-off front-rear end section of the sleeve hole at a fixed adjustment angle; and stitching each of the front-rear shoulder ridge lines together.
A suit pattern comprising:
A measuring device for suit pattern comprising:
Dependencies are inferred from the claim text.