Measurement system, calibration method, lithographic apparatus and positioner
AssigneeASML Netherlands B.V.
InventorJohannes Maria Van Benten
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AssigneeASML Netherlands B.V.
InventorJohannes Maria Van Benten
Estimating the term…
The invention relates to a measurement system for a projection system of a lithographic apparatus, comprising: —a sensor plate; —a detector comprising an array of detector areas; —a randomly ordered optical fiber bundle; —a positioner to position the sensor plate in the projection system; and —a control unit to control the positioning of the sensor plate and to obtain measurement data from an output of the detector, wherein a first free end of the optical fiber bundle is arranged to receive light from the sensor plate, wherein a second free end of the optical fiber bundle opposite the first free end of the optical fiber bundle is aligned with the array of detector areas of the detector, and wherein the control unit is configured to match each detector area with a corresponding location in a pupil plane of the projection system by collecting measurement data corresponding to different positions of the sensor plate relative to the projection system.
A measurement system for a projection system of a lithographic apparatus, wherein the projection system is configured to project a patterned radiation beam, the measurement system comprising:
A calibration method comprising:
A lithographic apparatus comprising:
A positioner for a substrate table of a lithographic apparatus, comprising:
A lithographic apparatus comprising:
Dependencies are inferred from the claim text.