Method and device for determining adjustments to sensitivity parameters

A metrology apparatus, comprising:

• memory;
• and
• at least one processor operable to at least:
• cause application of an incident radiation beam to a first substrate comprising first features of a first layer and second features of a second layer, a first relationship between the first features and the second features being characterized by a parameter of interest having a first value, wherein the metrology apparatus is operated in accordance with at least one characteristic having a first setting;
• cause receipt of first intensity data representing intensity of at least a portion of the incident radiation beam scattered by the first features and the second features;
• determine, based on the first intensity data, a second value of the parameter of interest for the first substrate;
• and
• apply one or more adjustments to the at least one characteristic such that the at least one characteristic has a second setting different from the first setting, the one or more adjustments being determined based on a first difference between the first value of the parameter of interest and the second value of the parameter of interest.

A non-transitory computer readable medium comprising instructions that, when executed by at least one processor of a computing system, causes the computing system to at least:

• receive first intensity data representing intensity of at least a portion of an incident radiation beam scattered by first features of a first layer of a substrate and by second features of a second layer of the substrate, the incident radiation beam applied to the first substrate by a metrology apparatus that operated in accordance with at least one characteristic having a first setting, wherein a first relationship between the first features and the second features is characterized by a parameter of interest having a first value;
• determine, based on the first intensity data, a second value of the parameter of interest for the first substrate;
• and
• determine one or more adjustments to the at least one characteristic such that the at least one characteristic has a second setting different from the first setting, the one or more adjustments being determined based on a first difference between the first value of the parameter of interest and the second value of the parameter of interest.