Production method of wired circuit board

A method for producing a wired circuit board including an insulating layer, and a first wire and a second wire disposed next to each other in spaced-apart relation on an upper side face of the insulating layer in a thickness direction of the insulating layer, where the thickness direction is orthogonal to a longitudinal direction and a width direction of the wired circuit board, the method comprising the steps of:

• a step (1), in which the insulating layer is provided, the upper side face of the insulating layer including at least one flat face and an inclination face, the inclination face being inclined with respect to the at least one flat face in the thickness direction;
• a step (2), in which a conductive layer is provided on the upper side face of the insulating layer including the inclination face and the at least one flat face;
• a step (3), in which a photoresist is provided on a surface of the conductive layer;
• a step (4), in which a photomask is disposed so that a first light exposure portion corresponding to the first wire in the photoresist and a second light exposure portion corresponding to the second wire in the photoresist are exposed to light, and the photoresist is exposed to light through the photomask;
• a step (5), in which a portion other than the first light exposure portion and the second light exposure portion in the photoresist is removed to expose the conductive layer from the portion other than the first light exposure portion and the second light exposure portion;
• and
• a step (6), in which the conductive layer exposed from the portion other than the first light exposure portion and the second light exposure portion is removed, and the first wire and the second wire are formed,
• wherein the inclination face includes an arc portion that has a generally arc shape when viewed from the top of the wired circuit board,
• in the step (4), the second light exposure portion of the photoresist has a facing portion which is disposed over the inclination face and thus faces the inclination face,
• in the step (4), the reflected light reflected at the conductive layer corresponding to the arc portion is focused on the photoresist corresponding to the center of a virtual circle along the arc portion, and
• in the step (4), the photomask is disposed so as to satisfy the following conditions A to C:
• Condition A:
• at least a portion of the first light exposure portion and at least a portion of the second light exposure portion are overlapped with the virtual circle when viewed from the top,
• Condition B:
• the photoresist has a light focused portion caused by light focus of the reflected light in the step (4) and removed in the step (5), and
• Condition C:
• the light focused portion is disposed in spaced-apart relation to at least one of the following:
• the first light exposure portion, the second light exposure portion, or both the first light exposure portion and the second light exposure portion.