Pattern-forming method

A pattern-forming method comprising:

• applying a radiation-sensitive composition on a substrate to provide a film on the substrate;
• exposing the film via a mask which has a predetermined pattern;
• and
• developing the film exposed to form a pattern in the film,
• wherein:
• the radiation-sensitive composition comprises a metal-containing component that is a metal compound having a hydrolyzable group, a hydrolysis product of the metal compound having a hydrolyzable group, a hydrolytic condensation product of the metal compound having a hydrolyzable group, or a combination thereof;
• a content of a transition metal atom in the metal-containing component with respect to total metal atoms in the metal-containing component is no less than 50 atomic %;
• and
• the metal compound having a hydrolyzable group comprises a compound represented by formula (1):
• LaMXb (1)
• wherein in the formula (1),
• M represents a transition metal atom,
• L represents a ligand, and a is 1 or 2, wherein in a case where a is 2, a plurality of Ls are identical or different, and
• X represents a hydrolyzable group selected from a halogen atom, an alkoxy group and a carboxylate group, and b is an integer of 2 to 6, wherein in a case where b is no less than 2, a plurality of Xs are identical or different, wherein the ligand represented by L does not fall under the definition of X.