System and method for localized EUV pellicle glue removal

A method, comprising:

• receiving an extreme ultraviolet (EUV) mask having an EUV pellicle disposed thereover, the EUV mask containing a low thermal expansion material (LTEM) substrate and a Ruthenium-containing capping layer, wherein the EUV pellicle is coupled to the EUV mask at least in part via a glue that is disposed on the LTEM substrate;
• removing the EUV pellicle via a heating process, wherein a first portion of the glue and a second portion of the glue are exposed after the EUV pellicle has been removed, wherein a portion of the EUV mask is disposed between the first portion of the glue and the second portion of the glue;
• and
• performing a chemical cleaning process to remove the first portion of the glue and the second portion of the glue without damaging the Ruthenium-containing capping layer;
• wherein the performing the chemical cleaning process includes:
• injecting, via a first tube vertically aligned with the first portion of the glue and filled with a positive pressure, a cleaning chemical on the first portion of the glue, the cleaning chemical reacting with the first portion of the glue to produce a first waste chemical, and removing the first waste chemical via a second tube filled with a negative pressure;
• moving one of the first tube and the EUV mask relative to the other such that the first tube is vertically aligned with the second portion of the glue, wherein no injection of the cleaning chemical on the EUV mask occurs during the moving of the one of the first tube and the EUV mask relative to the other;
• after the moving of the one of the first tube and the EUV mask relative to the other, injecting the cleaning chemical on the second portion of the glue, the cleaning chemical reacting with the second portion of the glue to produce a second waste chemical, and removing the second waste chemical via the second tube.

A method, comprising:

• detaching a pellicle from an extreme ultraviolet (EUV) mask, wherein the detaching exposes a first portion of glue and a second portion of glue on the EUV mask, wherein a portion of the EUV mask is disposed between the first portion of glue and the second portion of glue on the EUV mask;
• and
• removing the first portion of glue and the second portion of glue without targeting the portion of the EUV mask via a process that includes:
• applying a first chemical to the first portion of glue via a first tube that is disposed over the first portion of glue, the first chemical reacting with the first portion of glue to produce a second chemical;
• after the applying of the first chemical to the first portion of glue and prior to moving one of the first tube and the EUV mask relative to the other, removing the second chemical via a second tube that circumferentially surrounds the first tube;
• moving the one of the first tube and the EUV mask relative to the other such that the first tube is disposed over the second portion of glue, wherein no injection of the first chemical on the EUV mask occurs during the moving of the one of the first tube and the EUV mask relative to the other;
• applying the first chemical to the second portion of glue via the first tube that is disposed over the second portion of glue, the first chemical reacting with the second portion of glue to produce the second chemical;
• after the applying of the first chemical to the second portion of glue and prior to the moving of the one of the first tube and the EUV mask relative to the other, removing the second chemical via the second tube that circumferentially surrounds the first tube;
• and
• applying de-ionized water to the EUV mask and spinning the EUV mask, wherein the applying of the de-ionized water to the EUV mask and the spinning of the EUV mask occur after the applying of the first chemical to the first portion of glue and prior to the moving of the one of the first tube and the EUV mask relative to the other such that the first tube is disposed over the second portion of glue.