Method to create thin functional coatings on light alloys
AssigneeAuckland Uniservices Limited
InventorsFengyan Hou, Yuxin Wang, Bo Hu, Christopher William Goode, Junzhe Dong
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Abstract
In example implementations, a method for producing a thin film coating is provided. The method includes pre-treating a substrate, placing the substrate in a bath comprising at least phosphoric acid and sulphuric acid to produce a thin anodized layer, rinsing the thin anodized layer in a solution, plating a surface of the thin anodized layer in an electro deposition bath following a plating current profile for a predetermined period, and increasing the plating current to the recommended bath plating current to produce the thin film coating having a desired initial coating thickness.
Claims12
A method for producing a coating, comprising:
- pre-treating a substrate;
- placing the substrate in a bath comprising at least phosphoric acid and sulphuric acid and anodizing the substrate to produce a thin anodized layer;
- rinsing the thin anodized layer in a solution;
- plating a surface of the thin anodized layer in a single electro deposition bath following a plating current profile for a predetermined period, wherein the plating current profile is selected as a percentage of a nominal plating current that is applied via a direct current or a pulsed direct current, wherein the plating current profile comprises ramping the plating current from 0 to between 0.1 amperes per square decimeter (A/dm2) and 2.0 A/dm2 for a first time period, then holding the plating current constant at a value between 0.1 A/dm2 and 2.0 A/dm2 for a second time period;
- and
- increasing the plating current from the value between 0.1 A/dm2 and 2.0 A/dm2 to a recommended bath plating current to produce the coating having a desired initial coating thickness.
Dependencies are inferred from the claim text.