Film formation apparatus

A film formation apparatus configured to form a thin film on a substrate within a vacuum container, comprising:

• a rotatable table disposed within the vacuum container and configured to revolve a substrate mounting region on which the substrate is mounted about a rotational center of the rotatable table;
• a first gas supply part configured to supply a source gas of the thin film to a first region through an injection portion formed to face the rotatable table, the first region being defined by partitioning a revolution plane through which the substrate mounting region passes, in a direction crossing a revolutional direction of the substrate mounting region;
• an exhaust part configured to exhaust a gas through an exhaust port formed to extend along a first closed path surrounding the injection portion;
• a second gas supply part configured to supply an separation gas for separating inner and outer sides of a second closed path from each other through an separation gas supply port formed to extend along the second closed path surrounding the exhaust port,
• a third gas supply part including a first gas injector and a second gas injector arranged to extend at a certain interval in the direction crossing the revolutional direction of the substrate mounting region with a second region defined outside the second closed path interposed between the first gas injector and the second gas injector, each of the first gas injector and the second gas injector having gas injection holes formed therein, through which a reaction gas reacting with the source gas is supplied toward the second region;
• and
• a plasma generation part configured to plasmarize the reaction gas injected toward the second region,
• wherein an angle defined between the first gas injector and the second gas injector is less than 180 degrees, and
• wherein the first gas injector and the second gas injector are arranged such that the gas injection holes formed in the first gas injector face the gas injection holes formed in the second gas injector.