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US 10,519,541 B2Granted
Reactor system for sublimation of pre-clean byproducts and method thereof
AssigneeASM IP Holdings B.V.
InventorsJohn Tolle, Eric Hill
Life of this patent
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Abstract
A reactor system and related methods are provided which may include a heating element in a wafer tray. The heating element may be used to heat the wafer tray and a substrate or wafer seated on the wafer tray within a reaction chamber assembly, and may be used to cause sublimation of a native oxide of the wafer.
Claims13
A method comprising the steps of:
- placing a wafer on a wafer tray inside a reaction chamber assembly;
- and
- powering a heating element within the wafer tray to raise a temperature of the wafer tray from a first temperature to a second temperature to cause oxide material on the wafer to undergo sublimation inside the reaction chamber assembly;
- wherein the wafer tray comprises a wafer tray recess configured to receive and retain the wafer, the wafer tray recess having an upwardly facing surface having a roughness average (Ra) of 0.4 mm or less across the entire upwardly facing surface.
1 more element
Dependencies are inferred from the claim text.