Liquid discharge apparatus, imprint apparatus and part manufacturing method

An imprint apparatus comprising:

• a head including a discharge port surface on which a discharge port is formed to discharge a first liquid;
• a first reservoir that includes a housing on which the head is mounted;
• a flexible member, separating an inner space of the first reservoir into a first chamber that stores the first liquid to be supplied to the head and communicates with an inside of the head, and a second chamber that stores a second liquid;
• a second reservoir that stores the second liquid to be supplied to the second chamber, the second reservoir being disposed in such a manner that a liquid surface of the second liquid in the second reservoir is positioned below the discharge port surface;
• a first flow path that communicates the second chamber with the second reservoir;
• a second flow path that communicates the second reservoir with the second chamber;
• a circulation unit that circulates the second liquid between the second reservoir and the second chamber through the first flow path and the second flow path;
• and
• a forming unit configured to bring a surface of a substrate on which the first liquid is discharged by the head and a surface of a mold on which an unevenness pattern is formed into contact with each other, so as to form a pattern corresponding to the unevenness pattern of the mold on the surface of the substrate.

A part manufacturing method for manufacturing a part including a substrate by using an imprint apparatus including:

• a head including a discharge port surface on which a discharge port is formed to discharge a first liquid;
• a first reservoir that includes a housing on which the head is mounted;
• a flexible member, separating an inner space of the first reservoir into a first chamber that stores the first liquid to be supplied to the head and communicates with an inside of the head, and a second chamber that stores a second liquid;
• a second reservoir that stores the second liquid to be supplied to the second chamber, the second reservoir being disposed in such a manner that a liquid surface of the second liquid stored in the second reservoir is positioned below the discharge port surface;
• a first flow path that communicates the second chamber with the second reservoir;
• a second flow path that communicates the second reservoir with the second chamber;
• and
• a circulation unit that circulates the second liquid between the second reservoir and the second chamber through the first flow path and the second flow path, the method comprising:
• applying the first liquid to a surface of a substrate by the head;
• bringing the surface of the substrate, on which the first liquid is discharged by the head, and a surface of a mold, on which an unevenness pattern is formed, into contact with each other, so as to form a pattern corresponding to the unevenness pattern of the mold on the surface of the substrate;
• and
• treating the substrate on which the pattern is formed.