Microreactor and method for loading a liquid
AssigneeDistretto Tecnologico Sicilia Micro E Nano Sistemi S.C.A.R.L.
InventorsSabrina Conoci, Maria Eloisa Castagna, Massimo Orazio Spata
Life of this patent
Estimating the term…
Abstract
A microreactor includes: a substrate (2; 102; 202) made of semiconductor material; a plurality of wells (5; 105; 205) separated by walls (6; 106; 206) in the substrate (2; 102; 202); a dielectric structure (7; 107; 207a, 207b) coating at least the top of the walls (6; 106; 206); a cap (3; 103; 203), bonded to the substrate (2; 102; 202) and defining a chamber (10; 110; 210) above the wells (5; 105; 205); and a biasing structure (2, 8, 13; 102, 108, 113; 202, 208a, 208b, 213), configured for setting up a voltage (VB) between the substrate (2; 102; 202) and the chamber (10; 110; 210).
Claims13
A microreactor comprising:
- a substrate of a semiconductor material;
- a plurality of wells separated by walls in the substrate;
- a dielectric structure covering at least tops of the walls;
- a cap bonded to the substrate and defining a chamber above the wells, the chamber being directly open to each of the wells;
- and,
- a biasing structure that, in use, establishes a first voltage on the substrate and a second voltage in the chamber, wherein:
- the biasing structure comprises a first electrode electrically connected to the substrate and directly underlying each of the wells, the biasing structure, in use, establishing the first voltage under each of the wells;
- and
- the biasing structure comprises needle-shaped second electrodes and the cap has biasing openings for introduction of the second electrodes into the chamber, the second electrodes, in use, establishing the second voltage in the chamber above each of the wells.
A microfluidic cartridge comprising:
- a support;
- and
- a microreactor on the support, the microreactor including:
- a substrate of a semiconductor material;
- a plurality of wells separated by walls in the substrate;
- a dielectric structure covering at least tops of the walls;
- a cap bonded to the substrate and defining a chamber above the wells, the chamber being directly open to each of the wells;
- and,
- a biasing structure that, in use, establishes a first voltage on the substrate and a second voltage in the chamber, wherein:
- the biasing structure comprises a first electrode electrically connected to the substrate and directly underlying each of the wells, the biasing structure, in use, establishing the first voltage under each of the wells;
- and
- the biasing structure comprises needle-shaped second electrodes and the cap has biasing openings for introduction of the second electrodes into the chamber, the second electrodes, in use, establishing the second voltage in the chamber above each of the wells.
Analysis equipment comprising:
- a reader device;
- a cartridge positioned in the reader device, the cartridge including:
- a support;
- and
- a microreactor according to on the support, the microreactor including:
- a substrate of a semiconductor material;
- a plurality of wells separated by walls in the substrate;
- a dielectric structure covering at least tops of the walls;
- a cap bonded to the substrate and defining a chamber above the wells, the chamber being directly open to each of the wells;
- and
- a biasing structure that, in use, establishes a first voltage on the substrate and a second voltage in the chamber, wherein:
- the biasing structure comprises a first electrode connected to the substrate and directly underlying each of the wells, the biasing structure, in use, establishing the first voltage under each of the wells;
- and
- the biasing structure comprises needle-shaped second electrodes and the cap has biasing openings for introduction of the second electrodes into the chamber, the second electrodes, in use, establishing the second voltage in the chamber above each of the wells.
Dependencies are inferred from the claim text.