Atomic layer deposition-inhibiting material

An atomic layer deposition-inhibiting material comprising a fluorine-containing resin represented by the following formula (I):

• X—[(CR12)p—CR4R5—(CR22)r—CR6R7—(CR32)q]n—Y (I)
• where:
• X and Y each independently is H, F, or CR113;
• R11 each independently is H or F;
• R1, R2, and R3 each independently is H or F;
• R4 and R6 each independently is H, F, or an alkyl group having 1 to 6 carbon atoms;
• R5 and R7 each independently is an alkyl group having 1 to 6 carbon atoms;
• or
• R5 and R7 may together form a group represented by the following formula:
• —(O)s—(CR122)t—
• where
• R12 represents H, F, or an alkyl group having 1 to 6 carbon atoms,
• s represents an integer of 0 to 2, and t represents an integer of 1 to 6;
• p, q, and r each independently is an integer of 0 to 6;
• and
• n is a natural number.