Sputtering target and method for producing the same
AssigneeFerrotec Ceramics Corporation
InventorsKen Okamoto, Tadahisa Arahori, Akishige Sato, Sachio Miyashita, Eiji Kusano, Muneaki Sakamoto
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Abstract
A sputtering target which is made of an alumina sintered body having a purity of not less than 99.99% by mass %, a relative density of not less than 98%, and an average grain size of less than 5 μm or is made of an alumina sintered body having a purity of not less than 99.999% by mass % and a relative density of not less than 98%. A sputtered film having an excellent insulation resistance and an excellent homogeneity can be obtained by using the sputtering target.
Claims2
A sputtering target made of an alumina sintered body which has a purity of not less than 99.99% by mass %, a relative density of not less than 98%, and an average grain size of less than 2 μm, and the sputtering target has a shape of a disc with an erosion surface continuous with a periphery of the disc.
Dependencies are inferred from the claim text.