# US 10,504,703 B2 · Plasma treatment apparatus

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- Number: US 10,504,703 B2
- Document ID: US10504703B2
- Status: Granted
- Kind: B2
- Application number: 15/851,662
- Filed: 2017-12-21
- Published: 2018-07-05
- Granted: 2019-12-10
- Earliest claimed: 2016-12-29
- Assignees: Industrial Technology Research Institute
- Applicants: Industrial Technology Research Institute
- Inventors: Hung-Yuan Hsieh
- Web page: https://patentgrep.com/patent/US10504703B2

## CPC

- H01J 37/32935: {Monitoring and controlling tubes by information coming from the object and/or discharge}
- B05D 3/141: {Plasma treatment}
- B05D 3/142: {Pretreatment}
- C03C 23/006: {by plasma or corona discharge}
- C23C 16/50: using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)}
- C23C 16/52: Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)}
- H01J 37/22: Optical {, image processing} or photographic arrangements associated with the tube
- H01J 37/244: Detectors; Associated components or circuits therefor
- H01J 37/32449: {Gas control, e.g. control of the gas flow}
- H01J 37/32541: {Shape}
- H01J 37/32733: {Means for moving the material to be treated}
- H01J 37/32917: {Plasma diagnostics}
- H01J 37/32972: {Spectral analysis}
- H01J 37/3299: {Feedback systems}
- C23C 16/04: Coating on selected surface areas, e.g. using masks
- C23C 18/1605: {by masking}
- C23C 18/2006: {by other methods than those of C23C18/22 - C23C18/30}
- C23C 18/206: {Use of metal other than noble metals and tin, e.g. activation, sensitisation with metals (sensitising with tin C23C18/285, sensitising with noble metals C23C18/30)}
- C23C 18/38: Coating with copper
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)
- B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02)
- C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)

## Abstract

A plasma treatment apparatus and a plasma treatment method are provided. The apparatus includes a chamber, a planar plasma-generating electrode, a sample suspension and holding system, and an optical observation system. The chamber defines a processing inner chamber, and the top portion of the chamber has a window. The planar plasma-generating electrode is located in the processing inner chamber for generating a planar plasma. The sample suspension and holding system is disposed opposite to the planar plasma-generating electrode in the processing inner chamber to suspend and hold a sample. The optical observation system is located in the processing inner chamber adjacent to the sample suspension and holding system to measure the thickness range of a planar plasma effective influence region through the window of the chamber.

## Claims

### Claim 1

A plasma treatment apparatus, comprising:
a chamber defining a processing inner chamber, wherein a top portion of the chamber has a window;
a planar plasma-generating electrode located in the processing inner chamber for generating a planar plasma;
a sample suspension and holding system disposed in the processing inner chamber opposite to the planar plasma-generating electrode for suspending and holding a sample, wherein the sample suspension and holding system comprises:
a clamping member; and
a first adjustable suspension member connected to the clamping member; and
an optical observation system located in the processing inner chamber adjacent to the sample suspension and holding system to measure a thickness range of an effective influence region of the planar plasma through the window of the chamber, wherein the optical observation system comprises:
an observation lens comprising a transparent substrate, a shelter coating located on a surface of the transparent substrate, and a fluorescent coating located on the shelter coating; and
a second adjustable suspension member connected to the observation lens for suspending and adjusting a height of the observation lens in the processing inner chamber.

### Claim 2 (depends on 1)

The plasma treatment apparatus of claim 1, wherein the optical observation system and the sample suspension and holding system are controllably linked.

### Claim 3 (depends on 1)

The plasma treatment apparatus of claim 1, wherein the optical observation system is unlinked from the sample suspension and holding system.

### Claim 4 (depends on 1)

The plasma treatment apparatus of claim 1, wherein the optical observation system further comprises:
a digital camera disposed outside the chamber opposite to the window; and
a fiber optic sensor located in the window for transmitting an optical signal to an external analysis equipment for confirming and checking the accuracy of the digital camera.

### Claim 5 (depends on 4)

The plasma treatment apparatus of claim 4, wherein the external analysis equipment comprises a spectrophotometer or a luminance meter for confirming and checking an accuracy of the digital camera.

### Claim 6 (depends on 1)

The plasma treatment apparatus of claim 1, wherein the planar plasma-generating electrode comprises a finger comb electrode, a square loop, a circular loop, a U-line, an S-line, or a serpentine line.

### Claim 7 (depends on 1)

The plasma treatment apparatus of claim 1, further comprising a pattern mask close to a surface of the sample to perform a treatment on a predetermined site of the sample.