# US 10,504,702 B2 · Adjustable extended electrode for edge uniformity control > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,504,702 B2 - Document ID: US10504702B2 - Status: Granted - Kind: B2 - Application number: 16/026,853 - Filed: 2018-07-03 - Published: 2018-11-01 - Granted: 2019-12-10 - Earliest claimed: 2016-12-16 - Assignees: Applied Materials, Inc. - Applicants: Applied Materials, Inc. - Inventors: Olivier Luere; Leonid Dorf; Rajinder Dhindsa; Sunil Srinivasan; Denis M. Koosau; James Rogers - Web page: https://patentgrep.com/patent/US10504702B2 ## CPC - H01J 37/32642: {Focus rings} - H01J 37/32: Gas-filled discharge tubes (heating by discharge H05B) - H01J 37/32082: {Radio frequency generated discharge (H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence)} - H01J 37/32449: {Gas control, e.g. control of the gas flow} - H01J 37/32513: {Sealing means, e.g. sealing between different parts of the vessel} - H01J 37/32522: {Temperature} - H01J 2237/334: Etching - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract Embodiments described herein generally related to a substrate processing apparatus. In one embodiment, a process kit for a substrate processing chamber disclosed herein. The process kit includes an edge ring having a top surface and a bottom surface. An adjustable tuning ring is positioned beneath the bottom surface of the edge ring. The adjustable tuning ring has an upper surface and a lower surface. The lower surface is configured to interface with an actuating mechanism configured to move the adjustable tuning ring relative to the edge ring. ## Claims ### Claim 1 A process kit for a substrate support in a processing chamber, the process kit comprising: an edge ring having a top surface and a bottom surface; and an adjustable tuning ring positioned beneath the bottom surface of the edge ring, the adjustable tuning ring having an upper surface and a lower surface, the lower surface configured to interface with an actuating mechanism configured to move the adjustable tuning ring relative to the edge ring. ### Claim 2 (depends on 1) The process kit of claim 1 wherein the adjustable tuning ring further comprises: an annular body; a cavity formed in the annular body, the cavity formed in the bottom surface of the annular body; and an access orifice formed in the annular body, the access orifice extending from the top surface of the adjustable tuning ring into the cavity. ### Claim 3 (depends on 2) The process kit of claim 2, wherein the access orifice has a first diameter and the cavity has a second diameter, the first diameter being smaller than the second diameter. ### Claim 4 (depends on 3) The process kit of claim 3, wherein the cavity has a first diameter and the access orifice has a second diameter, the first diameter being larger than the second diameter. ### Claim 5 (depends on 2) The process kit of claim 2, wherein the adjustable tuning ring further comprises: a coating formed on the upper surface. ### Claim 6 A substrate support for a substrate processing chamber, the substrate support comprising: a dielectric body configured to support a substrate thereon; an edge ring disposed at least partially on the dielectric body, the edge ring having a top surface and a bottom surface; an adjustable tuning ring positioned beneath the edge ring, the adjustable tuning ring having a top surface, the top surface of the adjustable tuning ring and the edge ring defining an adjustable gap; and an actuating mechanism coupled to the adjustable tuning ring, the actuating mechanism configured to alter the adjustable gap. ### Claim 7 (depends on 6) The substrate support of claim 6, wherein the actuating mechanism comprises: a lift pin having a first end and a second end, the first end of the lift pin contacting a bottom surface of the adjustable tuning ring, the second end of the lift pin in communication with a lift mechanism. ### Claim 8 (depends on 6) The substrate support of claim 6, wherein the adjustable tuning ring further comprises: an access orifice disposed in the top surface, the access orifice having a first diameter smaller than a second diameter. ### Claim 9 (depends on 8) The substrate support of claim 8, wherein the actuating mechanism is a screw accessible through the access orifice, the screw configured to be rotated through the access orifice to actuate the adjustable tuning ring. ### Claim 10 (depends on 6) The substrate support of claim 6 further comprising: a cooling plate disposed below the dielectric body, wherein the cooling plate couples power to the edge ring at least partially through the tuning ring. ### Claim 11 (depends on 10) The substrate support of claim 10, wherein a capacitance between the edge ring and the tuning ring is adjustable by the actuating mechanism. ### Claim 12 (depends on 10) The substrate support of claim 10 further comprising: one or more dielectric pads disposed between the tuning ring and the cooling plate, the dielectric pads creating a gap decreasing a capacitance and minimizing the power coupled from the cathode to the tuning ring. ### Claim 13 A processing chamber comprising: a dielectric body disposed in the processing chamber and configured to support a substrate thereon; an edge ring disposed at least partially on the dielectric body, the edge ring having a top surface and a bottom surface; an adjustable tuning ring positioned beneath the edge ring, the adjustable tuning ring having a top surface, the top surface of the adjustable tuning ring and the edge ring defining an adjustable gap; and an actuating mechanism coupled to the adjustable tuning ring, the actuating mechanism configured to alter the adjustable gap. ### Claim 14 (depends on 13) The processing chamber claim 13, wherein the actuating mechanism comprises: a lift pin having a first end and a second end, the first end of the lift pin contacting a bottom surface of the adjustable tuning ring, the second end of the lift pin in communication with a lift mechanism. ### Claim 15 (depends on 13) The processing chamber claim 13, wherein the adjustable tuning ring further comprises: an access orifice disposed in the top surface, the access orifice having a first diameter smaller than a second diameter. ### Claim 16 (depends on 15) The processing chamber of claim 15, wherein the actuating mechanism is a screw accessible through the access orifice, the screw configured to be rotated through the access orifice to actuate the adjustable tuning ring. ### Claim 17 (depends on 13) The processing chamber of claim 13 further comprising: a cooling plate disposed below the dielectric body, wherein the cooling plate couples power to the edge ring at least partially through the tuning ring. ### Claim 18 (depends on 17) The processing chamber of claim 17, wherein a capacitance between the edge ring and the tuning ring is adjustable by the actuating mechanism. ### Claim 19 (depends on 17) The processing chamber of claim 17 further comprising: one or more dielectric pads disposed between the tuning ring and the cooling plate, the dielectric pads creating a gap. ### Claim 20 (depends on 13) The processing chamber of claim 13, wherein the actuating mechanism is configured to control a size of a plasma sheath formed between a plasma and the substrate.