# US 10,504,686 B2 · Charged particle beam writing method and charged particle beam writing apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,504,686 B2 - Document ID: US10504686B2 - Status: Granted - Kind: B2 - Application number: 15/943,745 - Filed: 2018-04-03 - Published: 2018-11-29 - Granted: 2019-12-10 - Earliest claimed: 2017-05-23 - Assignees: NuFlare Technology, Inc. - Applicants: NuFlare Technology, Inc. - Inventors: Munehiro Ogasawara; Takanao Touya - Web page: https://patentgrep.com/patent/US10504686B2 ## CPC - H01J 37/141: Electromagnetic lenses - H01J 37/153: Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators - H01J 37/20: Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support - H01J 37/24: Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for - H01J 37/3007: {Electron or ion-optical systems} - H01J 37/3174: {Particle-beam lithography, e.g. electron beam lithography} - H01J 2237/04922: electromagnetic - H01J 2237/04924: electrostatic - H01J 2237/141: Coils - H01J 2237/1505: Rotating beam around optical axis - H01J 2237/31776: Shaped beam - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract A charged particle beam writing method includes forming an aperture image by making a charged particle beam pass through an aperture substrate, changing, in the state where a plurality of crossover positions of the charged particle beam and positions of all of one or more intermediate images of the aperture image are adjusted to matching positions with respect to the aperture image with the first magnification, magnification of the aperture image from the first magnification to the second magnification by using a plurality of lenses while maintaining the last crossover position of the charged particle beam and the position of the last intermediate image of the aperture image to be fixed, and forming, using an objective lens, the aperture image whose magnification has been changed to the second magnification on the surface of the target object, and writing the aperture image. ## Claims ### Claim 1 A charged particle beam writing method comprising: forming an aperture image by making a charged particle beam pass through an aperture substrate; changing, in a state where a plurality of crossover positions of the charged particle beam and positions of all of one or more intermediate images of the aperture image are adjusted to matching positions with respect to the aperture image with a first magnification, magnification of the aperture image from the first magnification to a second magnification by using a plurality of lenses while maintaining a last crossover position of the charged particle beam and a position of a last intermediate image of the aperture image to be fixed; and forming, using an objective lens, the aperture image whose magnification has been changed to the second magnification on a surface of a target object, and writing the aperture image. ### Claim 2 (depends on 1) The method according to claim 1, wherein, in a case of changing the first magnification to the second magnification, the plurality of lenses make rotation of the aperture image formed on the surface of the target object not occur. ### Claim 3 (depends on 1) The method according to claim 1, wherein three or more electrostatic lenses are used as the plurality of lenses. ### Claim 4 (depends on 1) The method according to claim 1, wherein four or more electromagnetic lenses are used as the plurality of lenses. ### Claim 5 (depends on 1) The method according to claim 1, wherein the one or more intermediate images of the aperture image are formed by at least one of the plurality of the lenses. ### Claim 6 (depends on 1) The method according to claim 1, wherein the changing the magnification of the aperture image by using the plurality of lenses includes setting lens values of some lenses of the plurality of lenses; setting, after the setting lens values of the some lenses of the plurality of lenses, lens values of rest of the plurality of lenses; and measuring a size of the aperture image. ### Claim 7 (depends on 6) The method according to claim 6, wherein the changing the magnification of the aperture image by using the plurality of lenses further includes determining, after the measuring the size of the aperture image, whether a last crossover position is located at a predetermined position. ### Claim 8 (depends on 1) The method according to claim 1 further comprising: determining, before changing the magnification of the aperture image, whether it is necessary to change the magnification of the aperture image. ### Claim 9 (depends on 1) The method according to claim 1 further comprising: determining, in accordance with a pattern to be written, whether it is necessary to change the magnification of the aperture image. ### Claim 10 A charged particle beam writing apparatus comprising: an emission source configured to emit a charged particle beam; a stage configured to mount thereon a target object; an aperture substrate configured to form an aperture image by making the charged particle beam pass therethrough; an objective lens configured to focus and form the aperture image on the target object; and a plurality of lenses arranged between the aperture substrate and the objective lens, configured to maintain a last crossover position of the charged particle beam and a position of a last intermediate image of the aperture image to be fixed and change magnification of the aperture image from a first magnification to a second magnification while maintaining the last crossover position of the charged particle beam and the position of the last intermediate image of the aperture image to be fixed, wherein four or more electromagnetic lenses are used as the plurality of lenses.