# US 10,503,086 B2 · Lithographic apparatus and device manufacturing method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,503,086 B2 - Document ID: US10503086B2 - Status: Granted - Kind: B2 - Application number: 16/068,211 - Filed: 2016-12-07 - Published: 2019-01-10 - Granted: 2019-12-10 - Earliest claimed: 2016-01-07 - Assignees: ASML Netherlands B.V. - Applicants: Asml Netherlands B.V. - Inventors: Hans Butler; Cornelius Adrianus Lambertus De Hoon; Fransiscus Mathijs Jacobs; Pavel Kagan; Jeroen Pieter Starreveld; Maurice Willem Jozef Etiënne Wijckmans - Web page: https://patentgrep.com/patent/US10503086B2 ## CPC - G03F 7/709: {Vibration, e.g. vibration detection, compensation, suppression or isolation} - G03F 7/70833: {Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground} - G03F 7/70866: {of mask or workpiece} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame. ## Claims ### Claim 1 A lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting a pattern to a cross section of the radiation beam to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which the stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame, the compliant portion being configured to enable a displacement of the first portion relative to the second portion in a vertical direction or about a horizontal axis. ### Claim 2 (depends on 1) The lithographic apparatus according to claim 1, wherein the compliant portion circumscribes an operating area of the stage assembly. ### Claim 3 (depends on 1) The lithographic apparatus according to claim 1, wherein the compliant portion of the base frame has a smaller thickness than the first portion. ### Claim 4 (depends on 1) The lithographic apparatus according to claim 1, wherein the first portion, the second portion and the compliant portion constitute a single body. ### Claim 5 (depends on 1) The lithographic apparatus according to claim 1, wherein the base frame constitutes a bottom portion of a vacuum chamber enclosing the projection system. ### Claim 6 (depends on 5) The lithographic apparatus according to claim 5, wherein the vacuum chamber further encloses the illumination system and the stage assembly. ### Claim 7 (depends on 1) The lithographic apparatus according to claim 1, wherein the projection system is mounted to the second portion of the base frame via at least one vibration isolator. ### Claim 8 (depends on 7) The lithographic apparatus according to claim 7, wherein the at least one vibration isolator comprises one of a sealed pneumatic isolator and a leaf spring. ### Claim 9 A method of manufacturing a device, the method comprising the steps of: providing a base frame onto which a stage assembly and a projection system are mounted, the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame, the compliant portion being configured to enable a displacement of the first portion relative to the second portion in a vertical direction or about a horizontal axis, the projection system being configured to project a patterned radiation beam onto a target portion of a substrate and the a stage assembly comprising a substrate table constructed to hold the substrate and a positioning device configured to displace the substrate table relative to the projection system; placing the substrate on the substrate table; displacing the substrate table with the substrate to a position where the projection system is capable of illuminating the substrate; and projecting the patterned radiation beam onto a target portion of the substrate. ### Claim 10 (depends on 2) The lithographic apparatus according to claim 2, wherein the compliant portion of the base frame has a smaller thickness than the first portion. ### Claim 11 (depends on 2) The lithographic apparatus according to claim 2, wherein the first portion, the second portion and the compliant portion constitute a single body. ### Claim 12 (depends on 6) The lithographic apparatus according to claim 6, wherein the base frame constitutes a bottom portion of a vacuum chamber enclosing the projection system. ### Claim 13 (depends on 12) The lithographic apparatus according to claim 12, wherein the vacuum chamber further encloses the illumination system and the stage assembly. ### Claim 14 A lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting a pattern to a cross section of the radiation beam to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which the stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame, the illumination system being mounted to the second portion of the base frame. ### Claim 15 A lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting a pattern to a cross section of the radiation beam to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which the stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame, the base frame being mounted to a pedestal with the first portion of the base frame being mounted to a first portion of the pedestal and the second portion of the base frame being mounted to a second portion of the pedestal.