# US 10,503,084 B2 · Lithographic apparatus and device manufacturing method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,503,084 B2 - Document ID: US10503084B2 - Status: Granted - Kind: B2 - Application number: 16/382,483 - Filed: 2019-04-12 - Published: 2019-10-03 - Granted: 2019-12-10 - Earliest claimed: 2002-11-12 - Assignees: ASML Netherlands B.V. - Applicants: Asml Netherlands B.V. - Inventors: Joeri Lof; Erik Theodorus Maria Bijlaart; Hans Butler; Sjoerd Nicolaas Lambertus Donders; Christiaan Alexander Hoogendam; Aleksey Yurievich Kolesnychenko; Erik Roelof Loopstra; Hendricus Johannes Maria Meijer; Jeroen Johannes Sophia Maria Mertens; Johannes Catharinus Hubertus Mulkens; Roelof Aeilko Siebrand Ritsema; Frank Van Schaik; Timotheus Franciscus Sengers; Klaus Simon; Joannes Theodoor De Smit; Alexander Straaijer; Bob Streefkerk; Helmar Van Santen; Antonius Theodorus Anna Maria Derksen; Hans Jansen; Jacobus Johannus Leonardus Hendricus Verspay - Web page: https://patentgrep.com/patent/US10503084B2 ## CPC - G03F 7/70858: {Environment aspects, e.g. pressure of beam-path gas, temperature (pollution aspects G03F7/70916)} - G03F 7/70341: {Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041)} - G03F 7/707: {Chucks, e.g. chucking or un-chucking operations or structural details} - G03F 7/70716: {Stages} - G03F 7/70775: {Position control, e.g. interferometers or encoders for determining the stage position} - G03F 7/7085: {Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate. ## Claims ### Claim 1 A substrate support configured to support a substrate in an immersion lithographic projection apparatus having a projection system configured to project a beam of radiation onto the substrate when supported on the substrate support and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate support when in the immersion lithographic projection apparatus, the substrate support comprising: a body to support the substrate, the body comprising: a plurality of first protrusions on a first side of the body; a plurality of second protrusions on a second side of the body opposite to the first side, the first protrusions arranged to support the substrate and an outer periphery of the body ringing the first and second sides; an opening configured to apply a low pressure to suck the substrate onto the body; and a port outward, relative to a center of the body, of the opening and at the outer periphery of the body, the port configured to drain liquid into the body. ### Claim 2 (depends on 1) The substrate support of claim 1, wherein the port is located between adjacent first protrusions and in a surface of the body at the first side from which the first protrusions protrude. ### Claim 3 (depends on 2) The substrate support of claim 2, wherein the body comprises an aperture located opposite to the port of one of the adjacent first protrusions, the aperture configured to pass fluid therethough. ### Claim 4 (depends on 1) The substrate support of claim 1, wherein the port is connected to a drain hole at the second side of the body. ### Claim 5 (depends on 1) The substrate support of claim 1, wherein the first and second sides meet a vertical generally planar surface of the body at the outer periphery. ### Claim 6 (depends on 1) A substrate stage comprising: a structure having a recess; and the substrate support of claim 1 located in the recess, wherein the recess is arranged such that a surface of the substrate when supported on the substrate support is essentially co-planar with a surface of the substrate stage outward of the substrate. ### Claim 7 (depends on 1) An immersion lithographic projection apparatus comprising: the substrate support according to claim 1; a projection system configured to project a beam of radiation onto a substrate when supported on the substrate support; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate support. ### Claim 8 A substrate support configured to support a substrate in an immersion lithographic projection apparatus having a projection system configured to project a beam of radiation onto the substrate when supported on the substrate support and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate support when in the immersion lithographic projection apparatus, the substrate support comprising: a body to support the substrate, the body comprising: a plurality of first protrusions on a first side of the body; a plurality of second protrusions on a second side of the body opposite to the first side, the first protrusions arranged to support the substrate; an opening configured to apply a low pressure to suck the substrate onto the body; and a port, at the first side of the body, configured to drain liquid into the body, the port connected to a drain hole at the second side of the body. ### Claim 9 (depends on 8) The substrate support of claim 8, wherein the port is located between adjacent first protrusions and in a surface of the body at the first side from which the first protrusions protrude. ### Claim 10 (depends on 9) The substrate support of claim 9, wherein the body comprises an aperture located opposite to the port of one of the adjacent first protrusions, the aperture configured to pass fluid therethough. ### Claim 11 (depends on 8) The substrate support of claim 8, wherein the first and second sides meet at a vertical generally planar surface of the body at an outer periphery of the body ringing the first and second sides. ### Claim 12 (depends on 8) A substrate stage comprising: a structure having a recess; and the substrate support of claim 8 located in the recess, wherein the recess is arranged such that a surface of the substrate when supported on the substrate support is configured to be essentially co-planar with a surface of the substrate stage outward of the substrate. ### Claim 13 (depends on 12) The substrate stage of claim 12, wherein the surface of the substrate stage is located on a member movable relative to a remainder of the substrate stage. ### Claim 14 (depends on 8) An immersion lithographic projection apparatus comprising: the substrate support according to claim 8; a projection system configured to project a beam of radiation onto a substrate when supported on the substrate support; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate support. ### Claim 15 A substrate support configured to support a substrate in an immersion lithographic projection apparatus having a projection system configured to project a beam of radiation onto the substrate when supported on the substrate support and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate support when in the immersion lithographic projection apparatus, the substrate support comprising: a body to support the substrate, the body comprising: a plurality of first protrusions on a first side of the body; a plurality of second protrusions on a second side of the body opposite to the first side, the first protrusions arranged to support the substrate and an outer periphery of the body forming a ring around the first and second sides; and a port, at the first side of the body and at the outer periphery, configured to drain liquid into the body, the port connected to a drain hole at the second side of the body and the port is located between adjacent first protrusions. ### Claim 16 (depends on 15) The substrate support of claim 15, wherein the substrate support has essentially the same shape and essentially same cross-sectional dimension, of the substrate. ### Claim 17 (depends on 16) The substrate support of claim 16, wherein the body comprises an aperture located opposite to the port of one of the adjacent first protrusions, the aperture configured to pass fluid therethough. ### Claim 18 (depends on 15) A substrate stage comprising: a structure having a recess; and the substrate support of claim 15 located in the recess, wherein the recess is arranged such that a surface of the substrate when supported on the substrate support is configured to be essentially co-planar with a surface of the substrate stage outward of the substrate. ### Claim 19 (depends on 18) The substrate stage of claim 18, wherein the surface of the substrate stage is located on a member movable relative to a remainder of the substrate stage. ### Claim 20 (depends on 15) An immersion lithographic projection apparatus comprising: the substrate support according to claim 15; a projection system configured to project a beam of radiation onto a substrate when supported on the substrate support; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate support.