# US 10,503,081 B2 · Carrying platform and exposure method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,503,081 B2 - Document ID: US10503081B2 - Status: Granted - Kind: B2 - Application number: 15/790,775 - Filed: 2017-10-23 - Published: 2018-09-27 - Granted: 2019-12-10 - Earliest claimed: 2017-03-27 - Assignees: Boe Technology Group Co., Ltd. - Applicants: Boe Technology Group Co., Ltd.; Ordos Yuansheng Optoelectronics Co., Ltd. - Inventors: Chunlong Yan; Jianjun Li; Xin Bai; Guiqi Liu - Web page: https://patentgrep.com/patent/US10503081B2 ## CPC - G03F 7/70725: {control} - B24B 41/068: {Table-like supports for panels, sheets or the like} - G03F 7/707: {Chucks, e.g. chucking or un-chucking operations or structural details} - G03F 7/70783: {Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight} - H10P 72/0462: {characterised by the construction of the processing chambers, e.g. modular processing chambers} - H10P 72/50: for positioning, orientation or alignment - G03F 7/70758: {Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving} - G03F 7/70775: {Position control, e.g. interferometers or encoders for determining the stage position} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - B24B: MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING (grinding of gear teeth B23F, of screw-threads B23G1/36; by electro-erosion B23H; abrasive or related blasting B24C; tools for grinding, buffing or sharpening B24D; polishing compositions C09G1/00; abrasives C09K3/14; electrolytic etching or polishing C25F3/00; grinding arrangements for use on assembled railway tracks E01B31/17); DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract A carrying platform and an exposure method are provided. The carrying platform includes: a plurality of sub-stands, configured to co-carry an object. Each sub-stand includes: a platform having a first carrying surface; and a position adjusting unit disposed on a side of the platform away from the first carrying surface and configured to adjust at least one of height or inclined angle of the platform. ## Claims ### Claim 1 A carrying platform, comprising: a plurality of sub-stands, configured to co-carry an object; wherein each sub-stand includes: a platform, having a first carrying surface; and a position adjusting unit, disposed on a side of the platform away from the first carrying surface and configured to adjust inclined angle of the platform, the carrying platform further comprise: a control unit, in communication with the position adjusting units of the respective plurality of sub-stands; wherein the control unit is configured to control the position adjusting unit of the respective sub-stands. ### Claim 2 (depends on 1) The carrying platform according to claim 1, wherein each sub-stand further includes: at least one distance detecting unit, disposed on the platform. ### Claim 3 (depends on 1) The carrying platform according to claim 1, further comprising: a worktable, wherein the plurality of sub-stands are disposed on the worktable in array. ### Claim 4 (depends on 1) The carrying platform according to claim 1, wherein, in a plan view of the carrying platform, a distance between adjacent sub-stands is smaller than 1/10 of a size of the first carrying surface of each sub-stand in a direction. ### Claim 5 (depends on 1) The carrying platform according to claim 1, wherein, in a plan view of the carrying platform, the first carrying surfaces of the plurality of sub-stands form a second carrying surface, and a size of the second carrying surface is larger than 1 m2. ### Claim 6 (depends on 1) The carrying platform according to claim 1, wherein, the position adjusting unit includes: at least one platform lift mechanism, configured to be lift up and down to adjust at least one of height or inclined angle of the platform. ### Claim 7 (depends on 6) The carrying platform according to claim 6, wherein, the at least one platform lift mechanism includes two or more platform lift mechanisms, disposed on an edge of the platform, wherein, the two or more platform lift mechanisms are operable independently. ### Claim 8 (depends on 6) The carrying platform according to claim 6, wherein the at least one platform lift mechanism includes an air cylinder. ### Claim 9 (depends on 6) The carrying platform according to claim 6, wherein the at least one platform lift mechanism includes: a fixing part, fixedly disposed on a side of the platform away from the first carrying surface; a rotary mechanism, including a rotary shaft; a connecting rod; a roller, having a bearing; wherein the rotary mechanism is disposed on the fixing part, one end of the connecting rod is fixedly connected to the rotary shaft and configured to move along an arc line along with the rotary shaft, and the other end of the connecting rod is fixedly connected to the bearing. ### Claim 10 (depends on 9) The carrying platform according to claim 9, wherein the rotary mechanism includes an electromotor. ### Claim 11 (depends on 2) The carrying platform according to claim 2, further comprising: a worktable, wherein the plurality of sub-stands are disposed on the worktable in array. ### Claim 12 (depends on 2) The carrying platform according to claim 2, wherein, in a plan view of the carrying platform, a distance between adjacent sub-stands is smaller than 1/10 of a size of the first carrying surface of each sub-stand in a direction. ### Claim 13 (depends on 2) The carrying platform according to claim 2, the first carrying surfaces of the plurality of sub-stands form a second carrying surface, and in a plan view of the carrying platform, a size of the second carrying surface is larger than 1 m2. ### Claim 14 (depends on 2) The carrying platform according to claim 2, the position adjusting unit includes: at least one platform lift mechanism, configured to be lift up and down to adjust at least one of height or inclined angle of the platform. ### Claim 15 An exposure method, comprising: providing a carrying platform including a plurality of sub-stands, configured to co-carry an object; wherein each sub-stand includes: a platform, having a first carrying surface and a position adjusting unit, disposed on a side of the platform away from the first carrying surface and configured to adjust inclined angle of the platform, and the carrying platform further comprise: a control unit, in communication with the position adjusting units of the respective plurality of sub-stands, wherein the control unit is configured to control the position adjusting unit of the respective sub-stands; placing an object to be exposed on the first carrying surface of the plurality of sub-stands; disposing a mask on a side of the object to be exposed away from the carrying platform; and controlling the position adjusting unit of at least one of the sub-stands by the control unit to adjust the inclined angle of the platform so as to adjust a gap between the mask and a portion of the object to be exposed. ### Claim 16 (depends on 15) The exposure method according to claim 15, wherein, controlling the position adjusting unit of at least one of the sub-stands by the control unit to adjust the inclined angle of the platform so as to adjust a gap between the mask and a portion of the object to be exposed includes: measuring the gaps between the mask and portions of the object to be exposed which are located at measuring positions respectively; and adjusting at least of height or inclined angle of the at least one of the sub-stands to enable a difference value between the gaps between the mask and the portions of the object to be exposed which are located at adjacent two of the measuring positions to be smaller than 20 μm, and to enable a difference value between the gaps between the object to be exposed and the mask at all the measuring positions to be smaller than 40 μm. ### Claim 17 (depends on 16) The exposure method according to claim 16, further comprising: performing an exposure with the mask; measuring a deviation value of an exposure pattern formed on the object to be exposed after the exposure; calculating an adjusting corrected value of the at least one of the sub-stands according to the deviation value; and adjusting at least one of height or inclined angle of the at least one of the sub-stands according to the adjusting corrected value to improve uniformity of the gaps between the mask and the respective portions of the object to be exposed. ### Claim 18 (depends on 17) The exposure method according to claim 17, further comprising: recording an adjusting value of the plurality of sub-stands before performing the exposure with the mask; recording the adjusting corrected value; and respectively exposing a plurality of objects belonging to a same batch as the object to be exposed according to the adjusting value and the adjusting corrected value.