# US 10,503,072 B2 · Methods of fabricating semiconductor devices with flattened hardmask layers > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,503,072 B2 - Document ID: US10503072B2 - Status: Granted - Kind: B2 - Application number: 15/783,593 - Filed: 2017-10-13 - Published: 2018-02-08 - Granted: 2019-12-10 - Earliest claimed: 2014-09-05 - Assignees: Samsung Electronics Co., Ltd. - Applicants: Samsung Electronics Co., Ltd. - Inventors: DoYoung Kim; Kyoungsil Park - Web page: https://patentgrep.com/patent/US10503072B2 ## CPC - G03F 7/32: Liquid compositions therefor, e.g. developers - H10P 50/28: of insulating materials - H10P 50/73: {using masks for insulating materials} - H10P 76/20: of masks comprising organic materials - H10P 76/2041: {Photolithographic processes} - H10P 76/4085: {characterised by the processes involved to create the masks} - H10P 95/08: {Planarisation of organic insulating materials} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract Methods of fabricating semiconductor devices may include forming a hardmask layer including a photosensitive hardmask material on lower structures. The hardmask layer may include a lower portion and an upper portion thereon. An exposing and developing process may be performed on the hardmask layer to remove the upper portion of the hardmask layer and thereby form a hardmask structure with a substantially flat top surface. ## Claims ### Claim 1 A method of fabricating a semiconductor device, comprising: forming a hardmask layer comprising a photosensitive hardmask material on a structure, the hardmask layer having a top surface comprising a first top surface on a lower portion of the hardmask layer and a second top surface, on an upper portion of the hardmask layer, wherein the first top surface is located at a first level and the second top surface is located at a second level higher than the first level; and performing an exposing and developing process on the hardmask layer that removes the upper portion of the hardmask layer while leaving the lower portion of the hardmask layer intact and forms a hardmask structure with a substantially flat top surface, wherein the flat top surface is located at a third level equal to or lower than the first level, and wherein the third level is higher than an upper surface of the structure. ### Claim 2 (depends on 1) The method of claim 1, wherein the photosensitive hardmask material comprises a resin, a photoresist material, and/or a cross-linking agent. ### Claim 3 (depends on 2) The method of claim 2, wherein the resin comprises aromatic hydrocarbon with two or more benzene rings, aromatic hydrocarbon with a hydroxyl group and two or more benzene rings, novolak, and/or poly hydroxyl styrene. ### Claim 4 (depends on 2) The method of claim 2, wherein the photoresist material comprises a photoacid generator and/or a photoactive compound. ### Claim 5 (depends on 1) The method of claim 1, wherein the upper portion of the hardmask layer is between the first level of the first top surface and the second level of the second top surface of the hardmask layer in a vertical direction, and wherein the lower portion of the hardmask layer is positioned below the first top surface of the hardmask layer in a vertical direction. ### Claim 6 (depends on 5) The method of claim 5, wherein the hardmask layer comprises a photosensitive material of a positive resist type, and the exposing and developing process is performed so that a depth of focus during exposure of the hardmask layer is positioned between the first and second top surfaces in a vertical direction, thereby exposing the upper portion of the hardmask layer. ### Claim 7 (depends on 5) The method of claim 5, wherein the hardmask layer comprises a photosensitive material of a positive resist type, and the exposing and developing process uses a reticle to block exposure of the lower portion of the hardmask layer. ### Claim 8 (depends on 5) The method of claim 5, wherein the hardmask layer comprises a photosensitive material of a negative resist type, and the exposing and developing process is performed so that a depth of focus is positioned between the first top surface of the hardmask layer and a bottom surface of the hardmask layer in a vertical direction, thereby exposing the lower portion of the hardmask layer. ### Claim 9 (depends on 5) The method of claim 5, wherein the hardmask layer comprises a photosensitive material of a negative resist type, the exposing and developing process is configured to locally expose a portion of the lower portion of the hardmask layer below the first top surface of the hardmask layer, using a reticle configured to expose the first top surface of the hardmask layer. ### Claim 10 (depends on 1) The method of claim 1, wherein the structure comprises lower patterns, and the removal of the upper portion of the hardmask layer exposes top surfaces of the lower patterns. ### Claim 11 (depends on 9) The method of claim 9, wherein the exposing and developing process is further configured to control a process time of the developing process to selectively remove a portion of the hardmask layer below the second top surface. ### Claim 12 A method of fabricating a semiconductor device, comprising: forming a structure on a substrate; forming a hardmask layer comprising a photosensitive hardmask material on the structure, the hardmask layer having a top surface comprising a first top surface on a lower portion of the hardmask layer and a second top surface on an upper portion of the hardmask layer, wherein the first top surface is located at a first level and the second top surface is located at a second level higher than the first level, wherein the upper portion of the hardmask layer is between the first level and the second level in a vertical direction, and wherein the lower portion of the hardmask layer is below the first top surface of the hardmask layer in a vertical direction; performing an exposing process on the hardmask layer wherein a depth of focus of a light source is configured to selectively expose a portion of the hardmask layer; and performing a developing process on the hardmask layer that removes the upper portion of the hardmask layer and forms a hardmask structure with a substantially flat top surface, wherein the flat top surface is located at a third level equal to or lower than the first level, and wherein the third level is higher than an upper surface of the structure. ### Claim 13 (depends on 12) The method of claim 12, wherein the hardmask layer comprises a photosensitive material of a positive resist type, wherein the depth of focus of the light source is configured to be between the first and second top surfaces, and wherein performing the exposing process exposes the upper portion of the hardmask layer and increases the solubility of the upper portion to a developing solution. ### Claim 14 (depends on 13) The method of claim 13, further comprising a reticle configured to expose the second top surface but not expose the first top surface, and wherein performing the developing process on the hardmask layer removes the upper portion of the hardmask layer but leaves a substantial portion of the lower portion of the hardmask layer remaining. ### Claim 15 (depends on 12) The method of claim 12, wherein the hardmask layer comprises a photosensitive material of a negative resist type, wherein the depth of focus of the light source is configured to be below or even with the first top surface, and wherein performing the exposing process exposes the lower portion of the hardmask layer and decreases the solubility of a portion of the lower portion of the hardmask layer to a developing solution. ### Claim 16 (depends on 15) The method of claim 15, further comprising a reticle configured to expose the first top surface but not expose the second top surface, and wherein performing the developing process on the hardmask layer comprises performing the developing process for a duration of time configured to remove the upper portion of the hardmask layer but leave a substantial portion of the lower portion of the hardmask layer remaining. ### Claim 17 (depends on 1) The method of claim 1, wherein the lower portion of the hardmask layer is on a first region of the structure, wherein the upper portion of the hardmask layer is on a second region of the structure, and wherein the substantially flat top surface is on the first region and the second region of the structure. ### Claim 18 (depends on 17) The method of claim 17, wherein the lower portion of the hardmask layer is on the first region and the second region of the structure. ### Claim 19 (depends on 12) The method of claim 12, wherein the lower portion of the hardmask layer is on a first region of the substrate, wherein the upper portion of the hardmask layer is on a second region of the substrate, and wherein the substantially flat top surface is on the first region and the second region of the substrate. ### Claim 20 (depends on 19) The method of claim 19, wherein the lower portion of the hardmask layer is on the first region and the second region of the substrate.