# US 10,503,071 B2 · Method for manufacturing light guide elements > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,503,071 B2 - Document ID: US10503071B2 - Status: Granted - Kind: B2 - Application number: 15/794,966 - Filed: 2017-10-26 - Published: 2019-05-02 - Granted: 2019-12-10 - Earliest claimed: 2017-10-26 - Assignees: Waymo LLC - Applicants: Waymo LLC - Inventors: Bernard Fidric; Pierre-yves Droz; David Hutchison - Web page: https://patentgrep.com/patent/US10503071B2 ## CPC - G02B 6/4214: {the intermediate optical element having redirecting reflective means, e.g. mirrors, prisms for deflecting the radiation from horizontal to down- or upward direction toward a device (G02B6/4246 takes precedence)} - G03F 9/7003: {Alignment type or strategy, e.g. leveling, global alignment} - G03F 7/26: Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence) - G02B 2006/12104: {Mirror; Reflectors or the like} - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract Systems and methods described herein relate to the manufacture of optical elements and optical systems. An example method includes overlaying a first mask on a photoresist material and a substrate, and causing a light source to illuminate the photoresist material through the first mask during a first exposure so as to define a first feature. During the first exposure, the light source is positioned at a non-normal angle with respect to a plane parallel to the substrate. The method includes developing the photoresist material so as to retain an elongate portion of the photoresist material on the substrate. A first end of the elongate portion includes an angled portion that is sloped at an angle with respect to a long axis of the elongate portion. The method also includes depositing a reflective material through a second mask onto the angled portion. ## Claims ### Claim 1 A method comprising: depositing a photoresist material on a substrate; overlaying a first mask on the photoresist material, wherein the first mask defines a first feature; causing a light source to illuminate the photoresist material through the first mask during a first exposure, wherein the light source is positioned at a first angle, wherein the first angle comprises a non-normal angle with respect to a plane parallel to the substrate; developing the photoresist material so as to retain an elongate portion of the photoresist material on the substrate, wherein a first end of the elongate portion comprises an angled portion, and wherein the angled portion is sloped at an angle with respect to a long axis of the elongate portion; overlaying a second mask on the developed photoresist material, wherein the second mask defines a second feature corresponding to the angled portion; and depositing a reflective material through the second mask onto the angled portion. ### Claim 2 (depends on 1) The method of claim 1, wherein the light source is optically coupled to a collimating lens. ### Claim 3 (depends on 1) The method of claim 1, further comprising: immersing the substrate and the photoresist material in a bath, wherein the bath comprises a liquid, wherein causing the light source to illuminate the photoresist material comprises causing the light source to illuminate the photoresist material through at least a portion of the liquid. ### Claim 4 (depends on 1) The method of claim 1, further comprising: causing the light source to illuminate the photoresist material through the first mask during a second exposure, wherein the second exposure comprises the light source being positioned at a second angle with respect to the plane parallel to the substrate. ### Claim 5 (depends on 1) The method of claim 1, further comprising: while causing the light source to illuminate the photoresist material through the first mask, adjusting a position of the substrate with respect to the light source. ### Claim 6 (depends on 1) The method of claim 1, further comprising: while causing the light source to illuminate the photoresist material through the first mask, adjusting a position of the light source with respect to the substrate. ### Claim 7 (depends on 1) The method of claim 1, wherein depositing the photoresist material on the substrate comprises depositing a negative photoresist on the substrate. ### Claim 8 (depends on 1) The method of claim 1, wherein the reflective material comprises a metal that is optically-reflective in a near-infrared wavelength range. ### Claim 9 (depends on 1) The method of claim 1, wherein the elongate portion comprises a light guide manifold, wherein the method further comprise: coupling an aperture plate to the light guide manifold, wherein the aperture plate comprises at least one aperture, wherein the at least one aperture is optically coupled to the light guide manifold. ### Claim 10 (depends on 9) The method of claim 9, wherein the aperture plate is coupled to a distal end of the light guide manifold, wherein the method further comprises: coupling a light-emitter device to a proximal end of the light guide manifold. ### Claim 11 A method comprising: depositing a photoresist material on a substrate; overlaying a first mask on the photoresist material, wherein the first mask defines a first feature; overlaying a second mask on the first mask, wherein the second mask defines a second feature; causing a light source to illuminate the photoresist material through the first mask and the second mask, wherein the light source is positioned at a first angle, wherein the first angle comprises a non-normal angle with respect to a plane parallel to the substrate; removing the second mask; overlaying a third mask on the first mask, wherein the third mask defines a third feature; causing the light source to illuminate the photoresist material through the third mask and the first mask during an initial exposure; developing the photoresist material so as to retain an elongate portion of the photoresist material on the substrate, wherein a first end of the elongate portion comprises an angled portion, and wherein the angled portion is sloped at an angle with respect to a long axis of the elongate portion; overlaying a fourth mask on the developed photoresist material, wherein the fourth mask defines a fourth feature to correspond to the angled portion; and depositing a reflective material through the fourth mask onto the angled portion. ### Claim 12 (depends on 11) The method of claim 11, further comprising: causing the light source to illuminate the photoresist material through the third mask and the first mask, wherein the light source is positioned at a second angle with respect to the plane parallel to the substrate during a subsequent exposure. ### Claim 13 (depends on 11) The method of claim 11, further comprising: while causing the light source to illuminate the photoresist material through the first mask and the second mask, adjusting a position of the substrate with respect to the light source. ### Claim 14 (depends on 11) The method of claim 11, further comprising: while causing the light source to illuminate the photoresist material through the third mask and the first mask, adjusting a position of the substrate with respect to the light source. ### Claim 15 (depends on 11) The method of claim 11, further comprising: while causing the light source to illuminate the photoresist material through the first mask and the second mask, adjusting a position of the light source with respect to the substrate. ### Claim 16 (depends on 11) The method of claim 11, further comprising: while causing the light source to illuminate the photoresist material through the third mask and the first mask, adjusting a position of the light source with respect to the substrate. ### Claim 17 (depends on 11) The method of claim 11, wherein depositing the photoresist material on the substrate comprises depositing a negative photoresist on the substrate. ### Claim 18 (depends on 11) The method of claim 11, wherein the reflective material comprises a metal that is optically-reflective in a near-infrared wavelength range. ### Claim 19 (depends on 11) The method of claim 11, wherein the elongate portion comprises a light guide manifold, wherein the method further comprises: coupling an aperture plate to the light guide manifold, wherein the aperture plate comprises at least one aperture, wherein the at least one aperture is optically coupled to the light guide manifold. ### Claim 20 (depends on 19) The method of claim 19, wherein the aperture plate is coupled to a distal end of the light guide manifold, wherein the method further comprises: coupling a light-emitter device to a proximal end of the light guide manifold.