# US 10,502,994 B2 · Color filter on array substrate and fabricating method thereof as well as a display device

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- Number: US 10,502,994 B2
- Document ID: US10502994B2
- Status: Granted
- Kind: B2
- Application number: 14/778,059
- Filed: 2015-04-14
- Published: 2016-10-20
- Granted: 2019-12-10
- Earliest claimed: 2014-10-31
- Assignees: Boe Technology Group Co., Ltd.
- Applicants: Boe Technology Group Co., Ltd.
- Inventors: Feng Zhang; Zhanfeng Cao; Qi Yao
- Web page: https://patentgrep.com/patent/US10502994B2

## CPC

- G02F 1/133345: {Insulating layers (G02F1/1335, G02F1/1337, G02F1/135, G02F1/136 take precedence)}
- G02F 1/133512: {Light shielding layers, e.g. black matrix (G02F1/136209 takes precedence)}
- G02F 1/133514: {Colour filters}
- G02F 1/13439: {characterised by their electrical, optical, physical properties; materials therefor; method of making}
- G02F 1/136209: {Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element}
- G02F 1/136286: {Wiring, e.g. gate line, drain line}
- G02F 1/134309: {characterised by their geometrical arrangement}
- G02F 1/134372: {for fringe field switching [FFS] where the common electrode is not patterned}
- G02F 1/13606: {having means for reducing parasitic capacitance}
- G02F 1/136222: {Colour filters incorporated in the active matrix substrate}
- G02F 2201/121: common or background
- G02F 2201/123: pixel
- G02F 2202/42: Materials having a particular dielectric constant
- G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS

## Abstract

The present invention provides a COA substrate and a fabricating method thereof as well as a display device, and relates to the field of display technology, which solves the problem of a relatively large parasitic capacitance to be generated between the data line and the common electrode layer because the common electrode layer is formed on the black matrix directly in the existing technical solution, avoids signal delay, and improves the image display quality of the display. The COA substrate comprises: a black matrix, a color filter, a common electrode layer and an organic insulating film layer formed on the black matrix, the common electrode layer is formed on the organic insulating film layer, the organic insulating film layer is arranged on the color filter and covers the position of the color filter; the material of the organic insulating film layer is an organic insulating material having a relative dielectric constant less than 10. The present invention is applied in the fabricating technology of a display device.

## Claims

### Claim 1

An array substrate, comprising:
a plurality of thin film transistors;
a first passivation layer on the plurality of thin film transistors;
a black matrix on the first passivation layer;
a color filter formed over a top surface of the black matrix and exposing at least a portion of the top surface of the black matrix, wherein a top surface of the color filter is higher than the exposed portion of the top surface of the black matrix;
an organic insulating film layer formed over a top surface of the color filter and the exposed portion of the top surface of the black matrix; and
a common electrode layer formed over a top surface of the organic insulating film layer,
wherein
the top surface of the organic insulating film layer is flat,
a material of the organic insulating film layer is an organic insulating material having a relative dielectric constant less than 10,
the color filter further exposes a portion of the black matrix corresponding to a data line, and the common electrode layer is arranged directly above the portion of the black matrix.

### Claim 2 (depends on 1)

The array substrate according to claim 1, wherein the color filter on array further comprises: a second passivation layer and a pixel electrode layer, wherein:
the second passivation layer is arranged on the common electrode layer, and covers a position of the common electrode layer;
the pixel electrode layer is arranged on the second passivation layer;
a material of the second passivation layer is an organic material having a relative dielectric constant less than 5.

### Claim 3 (depends on 2)

The array substrate according to claim 2, wherein
the thickness of the second passivation layer is greater than or equal to lμm.

### Claim 4 (depends on 1)

The array substrate according to claim 1, wherein
the material of the organic insulating film layer is an organic insulating material having a relative dielectric constant less than 5.

### Claim 5 (depends on 1)

The array substrate according to claim 1, wherein
the thickness of the organic insulating film layer is greater than or equal to lμm.

### Claim 6 (depends on 1)

A display device, wherein the display device comprises an array substrate as claimed in claim 1.

### Claim 7 (depends on 6)

The display device according to claim 6, wherein the array substrate further comprises: a second passivation layer and a pixel electrode layer, wherein:
the second passivation layer is arranged on the common electrode layer, and covers a position of the common electrode layer;
the pixel electrode layer is arranged on the second passivation layer;
a material of the second passivation layer is an organic material having a relative dielectric constant less than 5.

### Claim 8 (depends on 7)

The display device according to claim 7, wherein
the thickness of the second passivation layer is greater than or equal to 1 μm.

### Claim 9 (depends on 6)

The display device according to claim 6, wherein
the material of the organic insulating film layer is an organic insulating material having a relative dielectric constant less than 5.

### Claim 10 (depends on 6)

The display device according to claim 6, wherein
the thickness of the organic insulating film layer is greater than or equal to 1 μm.

### Claim 11

A method of fabricating an array substrate, wherein the method comprises:
forming a plurality of thin film transistors on a top surface of a substrate;
forming a first passivation layer on the plurality of thin film transistors;
forming a black matrix on the first passivation layer;
forming a color filter over a top surface of the black matrix, wherein the color filter exposes at least a portion of the top surface of the black matrix and a top surface of the color filter is higher than the exposed portion of the top surface of the black matrix;
forming an organic insulating film layer over a top surface of the color filter and the exposed portion of the top surface of the black matrix using an organic insulating material having a relative dielectric constant less than 10;
forming a common electrode layer over a top surface of the organic insulating film layer, wherein the top surface of the organic insulating film layer is flat,
wherein the color filter further exposes a portion of the black matrix corresponding to a data line, and the common electrode layer is arranged directly above the portion of the black matrix.

### Claim 12 (depends on 11)

The method according to claim 11, wherein the method further comprises:
forming a second passivation layer covering the common electrode layer on the common electrode layer using an organic material having a relative dielectric constant less than 5;
forming a pixel electrode layer on the second passivation layer.

### Claim 13 (depends on 12)

The method according to claim 12, wherein the step of forming a second passivation layer covering the common electrode layer on the common electrode layer using an organic material having a relative dielectric constant less than 5 comprises:
forming the second passivation layer having a thickness greater than or equal to lμm and covering the common electrode layer on the common electrode layer using an organic material having a relative dielectric constant less than 5.

### Claim 14 (depends on 11)

The method according to claim 11, wherein the step of forming an organic insulating film layer covering the color filter on the color filter using an organic insulating material having a relative dielectric constant less than 10 comprises:
forming an organic insulating layer film having a thickness greater than or equal to 1 μm on the color filter using an organic insulating material having a relative dielectric constant less than 5;
forming the organic insulating film layer covering the color filter by processing the organic insulating layer film through patterning process.