Apparatus and method for generating a vapor for a CVD or PVD device

An apparatus for generating a vapor for a chemical vapor deposition (CVD) or physical vapor deposition (PVD) device, the apparatus comprising:

• a single or multistage vaporization device (1, 2) with a first heat transfer surface that is configured to, when heated to a vaporization temperature, vaporize solid or liquid particles, wherein the vapor generated by vaporization of the particles is transported out of the vaporization device (1, 2) by a carrier gas in a flow direction of the carrier gas;
• a single or multistage modulation device (3, 4), arranged after the vaporization device (1, 2) in the flow direction, having second heat transfer surfaces that are adjusted to a first modulation temperature at which the vapor passes through the modulation device (3, 4) without condensing in a material-cumulative manner on the second heat transfer surfaces, and a second modulation temperature at which at least a portion of the vapor condenses in a material-cumulative manner on the second heat transfer surfaces;
• and
• a supply pipe (14) for supplying a cooling gas into the modulation device (3, 4).

An apparatus for generating a vapor for a chemical vapor deposition (CVD) or physical vapor deposition (PVD) device, the apparatus comprising:

• a single or multistage vaporization device (1, 2) with a first heat transfer surface that is configured to, when heated to a vaporization temperature, vaporize solid or liquid particles, wherein the vapor generated by vaporization of the particles is transported out of the vaporization device (1, 2) by a carrier gas in a flow direction of the carrier gas;
• and
• a single or multistage modulation device (3, 4), arranged after the vaporization device (1, 2) in the flow direction, having second heat transfer surfaces that are adjusted to a first modulation temperature at which the vapor passes through the modulation device (3, 4) without condensing in a material-cumulative manner on the second heat transfer surfaces, and a second modulation temperature at which at least a portion of the vapor condenses in a material-cumulative manner on the second heat transfer surfaces,
• wherein the vaporization device (1, 2) and the modulation device (3, 4) each comprise two open-pored foam bodies arranged one after the other in the flow direction, and
• wherein a first foam body of the vaporization device (2) is configured as a pre-heating device for the carrier gas and is spaced apart from a second foam body of the vaporization device (2) by an intermediate space (10), the apparatus further comprising an aerosol supply pipe (9) connected to the intermediate space (10), the aerosol supply pipe (9) configured to supply an aerosol comprising the solid or liquid particles into the intermediate space (10).

An apparatus for generating a vapor for a chemical vapor deposition (CVD) or physical vapor deposition (PVD) device, the apparatus comprising:

• a single or multistage vaporization device (1, 2) with a first heat transfer surface that is configured to, when heated to a vaporization temperature, vaporize solid or liquid particles, wherein the vapor generated by vaporization of the particles is transported out of the vaporization device (1, 2) by a carrier gas in a flow direction of the carrier gas;
• and
• a single or multistage modulation device (3, 4), arranged after the vaporization device (1, 2) in the flow direction, having second heat transfer surfaces that are adjusted to a first modulation temperature at which the vapor passes through the modulation device (3, 4) without condensing in a material-cumulative manner on the second heat transfer surfaces, and a second modulation temperature at which at least a portion of the vapor condenses in a material-cumulative manner on the second heat transfer surfaces,
• wherein the vaporization device (1, 2) and the modulation device (3, 4) each comprise two open-pored foam bodies arranged one after the other in the flow direction, and
• wherein the two foam bodies of the modulation device (3, 4) arranged one after the other in the flow direction are separated from each other by an intermediate space (12), the apparatus further comprising a cooling gas supply line (14) connected to the intermediate space (12), the cooling gas supply line (14) configured to introduce a cooling gas into the intermediate space (12).