# US 10,501,627 B2 · Composition for optical imprint and method for producing pattern using the same > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,501,627 B2 - Document ID: US10501627B2 - Status: Granted - Kind: B2 - Application number: 14/598,596 - Filed: 2015-01-16 - Published: 2015-07-23 - Granted: 2019-12-10 - Earliest claimed: 2014-01-17 - Assignees: Tokyo Ohka Kogyo Co., Ltd. - Applicants: Tokyo Ohka Kogyo Co., Ltd. - Inventors: Atsushi Murota - Web page: https://patentgrep.com/patent/US10501627B2 ## CPC - C08L 83/04: Polysiloxanes - C08K 5/07: Aldehydes; Ketones - C08K 5/08: Quinones - G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping} - G03F 7/0388: {with ethylenic or acetylenic bands in the side chains of the photopolymer} - G03F 7/0757: {Macromolecular compounds containing Si-O, Si-C or Si-N bonds (G03F7/0752 takes precedence)} - G03F 7/40: Treatment after imagewise removal, e.g. baking - G06F 7/40: using contact-making devices, e.g. electromagnetic relay (G06F7/46 takes precedence) - C08G 77/20: containing silicon bound to unsaturated aliphatic groups - C08G 77/80: {Siloxanes having aromatic substituents, e.g. phenyl side groups} - C08L: COMPOSITIONS OF MACROMOLECULAR COMPOUNDS (compositions based on polymerisable monomers C08F, C08G; artificial filaments or fibres D01F; textile treating compositions D06) - C08K: Use of inorganic or non-macromolecular organic substances as compounding ingredients (paints, inks, varnishes, dyes, polishes, adhesives C09) - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - G06F: ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models G06N) - C08G: MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ## Abstract A composition for optical imprint having excellent transferability of a mold shape and giving a pattern having excellent alkali resistance at high temperature by optical imprint and subsequent heating and a method for producing a pattern using the composition. The composition includes a polysiloxane including a structural unit 1 represented by Formula (a1) and a structural unit 2 represented by Formula (a2) and a polymerization initiator. The polysiloxane has a structural unit 1 content of 30% to 85% by mole and a structural unit 2 content of 15% to 70% by mole based on the entire structural units in the polysiloxane. In the formulae, R1 represents a group containing an ethylenic double bond, and R2 represents an aryl group having 6 to 15 carbon atoms which may have a substituent. ## Claims ### Claim 1 A composition for optical imprint comprising: a polysiloxane; an organic solvent; and a polymerization initiator, wherein the polysiloxane consists of a polysiloxane represented by formula (a3) below: wherein R1 represents a group containing an ethylenic double bond; R2 represents an aryl group having 6 to 15 carbon atoms which may have a substituent; R3 represents an alkyl group having 1 to 6 carbon atoms; subscripts p, q, and r represent mole percentages of the structural units referred to by the subscripts based on the total moles of structural units in the polysiloxane; the percentage p is 30% to 85% by mole; the percentage q is 15% to 70% by mole; and the percentage r is 0% to 40% by mole; provided that the sum of the percentages p, q, and r is 100% by mole, and the percentage r is not higher than the percentage p, and wherein the composition for optical imprint does not comprise an alkoxysilane. ### Claim 2 (depends on 1) The composition for optical imprint according to claim 1, wherein the structural unit 2 content is 20% to 60% by mole based on the entire structural units in the polysiloxane. ### Claim 3 (depends on 1) The composition for optical imprint according to claim 1, wherein R1 represents a group containing an ethylenic double bond at a terminal thereof. ### Claim 4 (depends on 1) The composition for optical imprint according to claim 1, wherein R1 represents an acryloyloxyalkyl or methacryloyloxyalkyl group. ### Claim 5 (depends on 1) The composition for optical imprint according to claim 1, wherein R2 represents an aryl group having 6 to 10 carbon atoms which may have a substituent. ### Claim 6 (depends on 1) The composition for optical imprint according to claim 1, wherein the structural unit 1 content is 40% to 80% by mole based on the entire structural units in the polysiloxane. ### Claim 7 (depends on 1) The composition for optical imprint according to claim 1, wherein a mass average molecular weight of the polysiloxane is 500 to 10000. ### Claim 8 (depends on 1) The composition for optical imprint according to claim 1, wherein R3 represents an alkyl group having 1 to 4 carbon atoms. ### Claim 9 (depends on 1) The composition for optical imprint according to claim 1, wherein the percentage p is 40% to 80% by mole. ### Claim 10 (depends on 1) The composition for optical imprint according to claim 1, wherein the percentage q is 20% to 60% by mole. ### Claim 11 (depends on 1) The composition for optical imprint according to claim 1, wherein the percentage r is 1% to 30% by mole. ### Claim 12 (depends on 1) The composition for optical imprint according to claim 1, wherein a content of the polymerization initiator is 0.01 to 20 parts by mass based on 100 parts by mass of the polysiloxane. ### Claim 13 (depends on 1) The composition for optical imprint according to claim 1, wherein the organic solvent is at least one selected from the group consisting of an alcohol, ketone, ester, ether, and aromatic organic solvent. ### Claim 14 (depends on 1) The composition for optical imprint according to claim 1, wherein an amount of the organic solvent is such that a concentration of the polysiloxane in the composition is 0.1% to 40% by mass. ### Claim 15 (depends on 1) A method for producing a pattern comprising: forming a composition layer of the composition for optical imprint according to claim 1 on a substrate; deforming the composition layer by pressing a mold against the composition layer; exposing the composition layer to light in a state of pressing the mold; peeling the mold from the exposed composition layer; and heating the composition layer after the peeling.