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US 10,501,369 B2Granted
Translucent substrate, organic LED element and method of manufacturing translucent substrate
AssigneeAGC Inc.
InventorsTakahiro Mashimo, Naoto Kihara, Kazunobu Maeshige, Teruo Fujiwara, Masahiro Kishi, Nobuhiro Nakamura, Mamoru Isobe
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Abstract
A translucent substrate includes a glass substrate containing at least one element selected from a group consisting of Bi, Ti and Sn; a coating layer formed on the glass substrate; and a transparent conductive film formed on the coating layer, wherein the coating layer is deposited by a dry depositing method.
Claims17
A translucent substrate comprising:
- a glass substrate comprising at least one element selected from the group consisting of Bi, Ti and Sn;
- a coating layer formed on the glass substrate;
- and
- a transparent conductive film formed on the coating layer, wherein the transparent conductive film comprises a film selected from the group consisting of an ITO film, a SnO2 film, a gallium zinc oxide (GZO) film, an indium zinc oxide (IZO) film, an Al doped ZnO film, a Ta doped SnO2 film, and a Ti doped In2O3 film,
- wherein the coating layer is deposited by a dry depositing method,
- wherein the degree of oxidation of the transparent conductive film is higher at a side near to the glass substrate than at a side far from the glass substrate,
- wherein the coating layer comprises oxide, nitrogen oxide or nitride, containing one or more elements selected from Si, Al, Ti, Nb, Zr, Sn, Ta and W,
- wherein a difference between a refraction index of the coating layer and a refraction index of the glass substrate, to light whose wavelength is 550 nm, is greater than or equal to minus 0.15, and less than or equal to plus 0.15,
- wherein a filling ratio of the coating layer is greater than or equal to 85%, the filling ratio being calculated by dividing the highest density in the coating layer which is measured using an X-ray reflectometer, by a theoretical density calculated from the composition of the coating layer, and multiplying by 100.
6 more elements
A translucent substrate comprising:
- a glass substrate;
- a scattering layer formed on the glass substrate and comprising at least one element selected from the group consisting of Bi, Ti and Sn;
- a coating layer formed on the scattering layer;
- and
- a transparent conductive film formed on the coating layer, wherein the transparent conductive film comprises a film selected from the group consisting of an ITO film, a SnO2 film, a gallium zinc oxide (GZO) film, an indium zinc oxide (IZO) film, an Al doped ZnO film, a Ta doped SnO2 film, and a Ti doped In2O3 film,
- wherein the coating layer is deposited by a dry depositing method,
- wherein the degree of oxidation of the transparent conductive film is higher at a side near to the glass substrate than at a side far from the glass substrate,
- wherein the coating layer comprises oxide, nitrogen oxide or nitride, containing one or more elements selected from Si, Al, Ti, Nb, Zr, Sn, Ta and W,
- wherein a difference between a refraction index of the coating layer and a refraction index of the scattering layer, to light whose wavelength is 550 nm, is greater than or equal to minus 0.15, and less than or equal to plus 0.15,
- wherein a filling ratio of the coating layer is greater than or equal to 85%, the filling ratio being calculated by dividing the highest density in the coating layer which is measured using an X-ray reflectometer, by a theoretical density calculated from the composition of the coating layer, and multiplying by 100.
7 more elements
Dependencies are inferred from the claim text.