# US 10,500,580 B2 · Method for forming catalytic nanocoating

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- Number: US 10,500,580 B2
- Document ID: US10500580B2
- Status: Granted
- Kind: B2
- Application number: 15/541,285
- Filed: 2015-12-08
- Published: 2017-12-21
- Granted: 2019-12-10
- Earliest claimed: 2014-12-31
- Assignees: Teknologian tutkimuskeskus VTT Oy
- Applicants: Teknologian Tutkimuskeskus Vtt Oy
- Inventors: Pekka Simell; Matti Reinikainen; Matti Putkonen; Johanna Kihlman
- Web page: https://patentgrep.com/patent/US10500580B2

## CPC

- B01J 37/0225: {of metal substrates}
- B01J 21/04: Alumina
- B01J 23/75: Cobalt
- B01J 23/8913: {Cobalt and noble metals}
- B01J 35/45: Nanoparticles
- B01J 37/0217: {Pretreatment of the substrate before coating}
- B01J 37/0219: {the coating containing organic compounds}
- B01J 37/0226: {Oxidation of the substrate, e.g. anodisation}
- B01J 37/0228: {in several steps}
- B01J 37/0238: {via the gaseous phase-sublimation}
- B01J 37/06: Washing {(B01J37/0009, B01J37/0018 take precedence)}
- B01J 37/088: {Decomposition of a metal salt}
- C23C 16/0209: {by heating}
- C23C 16/45553: {characterized by the use of precursors specially adapted for ALD}
- B01J: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)

## Abstract

Provided is a method forming a catalytic nanocoating on a surface of a metal plate, wherein the method comprises pretreating the surface of the metal plate by means of heat treatment at 500-800° C., forming a metaloxide support by washcoating on the surface of the metal plate, and coating the surface of the metal plate by depositing catalytically active metals and/or metaloxides on the metaloxide support by means of an atomic layer deposition (ALD) method in order to form a thin and conformal catalyst layer on the metal plate. Further, the invention relates to a catalyst and a use.

## Claims

### Claim 1

A method for forming a catalytic nanocoating on a surface of a metal plate, wherein the method comprises
pretreating the surface of the metal plate by means of heat treatment at 500-800° C.,
forming a metal oxide support by washcoating on the surface of the metal plate such that the surface of the metal plate is washcoated with a metal oxide based slurry,
calcining the metal oxide support at 500-800° C. after the washcoating, and
coating the surface of the metal plate by depositing catalytically active metals and/or metal oxides on the metal oxide support by means of an atomic layer deposition (ALD) method in order to form a thin and conformal catalyst layer on the metal plate.

### Claim 2 (depends on 1)

The method according to claim 1, wherein the surface of the metal plate is heat-treated by oxidizing.

### Claim 3 (depends on 1)

The method according to claim 1, wherein the washcoating is carried out by spraying or dip-coating.

### Claim 4 (depends on 1)

The method according to claim 1, wherein catalytically active metals and/or metal oxides are deposited at 50-700° C. on the metal oxide support by means of an atomic layer deposition (ALD) method.

### Claim 5 (depends on 1)

The method according to claim 1, wherein the thickness of the catalyst layer is between 1-500 nm.

### Claim 6 (depends on 1)

The method according to claim 1, wherein tris(2,2,6,6-tetramethyl-3,5-heptanedionato)cobalt and ozone are used as precursors in the atomic layer deposition (ALD).

### Claim 7 (depends on 1)

The method according to claim 1, wherein the metal oxide support comprises Al2O3, MgO, TiO2, other metal oxide or their combination.

### Claim 8 (depends on 1)

The method according to claim 1, wherein catalytically active metal and/or metal oxide comprises metal selected from the group consisting of Co, Ni, Mo, Zr, Ti, Hf, noble metal, other suitable metal and their combinations.