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US 10,493,101 B2Granted
Antimicrobial composition
AssigneeConvatec Technologies Inc.
InventorsSteven L. Percival, Phillip G. Bowler, David Parsons
Life of this patent
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Abstract
An antiseptic composition suitable for use on skin and wounds comprising a source of an antimicrobial agent and an agent which disrupts biofilms. More, particularly the invention relates to a composition capable of providing effective antimicrobial activity while at the same time avoiding wound and skin irritation and retardation of wound healing.
Claims7
An antiseptic composition suitable for use on skin and wounds comprising 0.1% to 10% silver, EDTA, and buffering agent;
- wherein the pH is maintained between 4 and 6.
Dependencies are inferred from the claim text.