MEMS microphone having improved sensitivity and method for the production thereof
AssigneeEpcos AG
InventorPirmin Hermann Otto Rombach
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Abstract
A MEMS microphone with improved sensitivity and a method for producing such a MEMS microphone are disclosed. In an embodiment the MEMS microphone includes a carrier substrate, a capacitor having two electrodes, a substrate-side anchor and an electrode anchor, wherein the substrate-side anchor connects the substrate to the capacitor, wherein the electrode anchor connects the two electrodes of the capacitor, wherein one of the electrodes is a backplate and the other electrode is the anchored membrane, and wherein the substrate-side anchor has a bearing area on the substrate which exceeds a minimum area necessary for a mechanical stability of the MEMS microphone by not more than the minimum area.
Claims5
A method for producing a MEMS microphone, the method comprising:
- providing a carrier substrate;
- arranging a lower sacrificial layer on the carrier substrate;
- producing a membrane on the lower sacrificial layer;
- arranging an upper sacrificial layer on the membrane;
- and
- producing a backplate on the upper sacrificial layer,
- wherein an etching rate of the lower sacrificial layer in a region which is intended to adjoin a later substrate-side anchor and/or an etching rate of the upper sacrificial layer in a region which is intended to adjoin a later capacitor anchor are/is increased after arranging the corresponding sacrificial layer.
Dependencies are inferred from the claim text.