# US 10,483,472 B2 · Schottky diode

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- Number: US 10,483,472 B2
- Document ID: US10483472B2
- Status: Granted
- Kind: B2
- Application number: 15/846,213
- Filed: 2017-12-19
- Published: 2018-07-26
- Granted: 2019-11-19
- Earliest claimed: 2017-01-20
- Assignees: Tsinghua University; Hon Hai Precision Industry Co., Ltd.
- Applicants: Tsinghua University; Hon Hai Precision Industry Co., Ltd.
- Inventors: Yu-Dan Zhao; Xiao-Yang Xiao; Ying-Cheng Wang; Yuan-Hao Jin; Tian-Fu Zhang; Qun-Qing Li
- Web page: https://patentgrep.com/patent/US10483472B2

## CPC

- H10K 10/23: Schottky diodes
- H10K 85/221: {Carbon nanotubes}
- H10K 71/135: {using ink-jet printing}
- H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES

## Abstract

A Schottky diode includes an insulating substrate and at least one Schottky diode unit. The at least one Schottky diode unit is located on a surface of the insulating substrate. The at least one Schottky diode unit includes a first electrode, a semiconductor structure and a second electrode. The semiconductor structure comprising a first end and a second end. The first end is laid on the first electrode, the second end is located on the surface of the insulating substrate. The semiconducting structure includes a carbon nanotube structure. The second electrode is located on the second end.

## Claims

### Claim 1

A Schottky diode comprising:
an insulating substrate and at least one Schottky diode unit, the at least one Schottky diode unit being located on a surface of the insulating substrate, wherein each of the at least one Schottky diode unit comprises:
a first electrode located on the surface of the insulating substrate;
a semiconductor structure comprising a first end and a second end opposite with the first end, the first end is laid on the first electrode, and the first electrode is located between the first end of the semiconductor structure and the surface of the insulating substrate, the second end of the semiconducting structure is located on the surface of the insulating substrate, the semiconducting structure comprises a carbon nanotube structure; and
a second electrode located on the second end of the semiconducting structure, and the second end of the semiconducting structure is located between the second electrode and the surface of the insulating substrate, and the second end of the semiconducting structure is in direct contact with the second electrode.

### Claim 2 (depends on 1)

The Schottky diode of claim 1, wherein the semiconducting structure is the carbon nanotube structure.

### Claim 3 (depends on 1)

The Schottky diode of claim 1, wherein the carbon nanotube structure is a single semiconducting carbon nanotube, the single semiconducting carbon nanotube is oriented from the first end to the second end.

### Claim 4 (depends on 1)

The Schottky diode of claim 1, wherein the carbon nanotube structure is a carbon nanotube film with a thickness less than 100 nanometers.

### Claim 5 (depends on 4)

The Schottky diode of claim 4, wherein the carbon nanotube film includes a plurality of carbon nanotube, a mass percent of semiconducting carbon nanotubes in the plurality of carbon nanotubes is ranged from about 80% to about 100%.

### Claim 6 (depends on 4)

The Schottky diode of claim 4, wherein the carbon nanotube film includes a plurality of carbon nanotubes arranged substantially parallel to each other and are oriented from the first electrode to the second electrode.

### Claim 7 (depends on 4)

The Schottky diode of claim 4, wherein the carbon nanotube film is an ordered carbon nanotube film comprising a plurality of carbon nanotubes arranged orderly.

### Claim 8 (depends on 4)

The Schottky diode of claim 4, wherein the carbon nanotube film is a disordered carbon nanotube film comprising a plurality of carbon nanotubes arranged disorderly.

### Claim 9 (depends on 8)

The Schottky diode of claim 8, wherein the disordered carbon nanotube film only comprise carbon nanotubes.

### Claim 10 (depends on 8)

The Schottky diode of claim 8, wherein the carbon nanotube film is formed by ink-jet printing.

### Claim 11 (depends on 10)

The Schottky diode of claim 10, wherein the carbon nanotube film is directly printed on the surface of the insulating substrate and the first electrode.

### Claim 12 (depends on 1)

The Schottky diode of claim 1, wherein the at least one Schottky diode unit comprises a plurality of Schottky diode units, the plurality of Schottky diode units are arranged in an array and separated from each other.

### Claim 13 (depends on 1)

The Schottky diode of claim 1, wherein the surface of the insulating substrate comprises groove structure, the first electrode is located in the groove structure, and an upper surface of the first electrode is flush with the surface of the insulating substrate, the semiconductor structure is horizontally disposed on the surface of the insulating substrate.

### Claim 14 (depends on 1)

The Schottky diode of claim 1, wherein the first electrode, the second electrode and the semiconductor structure forming an asymmetric structure.

### Claim 15 (depends on 14)

The Schottky diode of claim 14, wherein the first electrode is located below the semiconductor structure, the second electrode is located above the semiconductor.