# US 10,483,107 B2 · Encoder head with birefringent elements for forming imperfect retroreflection and exposure system utilizing the same > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,483,107 B2 - Document ID: US10483107B2 - Status: Granted - Kind: B2 - Application number: 15/800,480 - Filed: 2017-11-01 - Published: 2018-03-01 - Granted: 2019-11-19 - Earliest claimed: 2016-04-11 - Assignees: Nikon Corporation - Applicants: Nikon Corporation - Inventors: Eric Peter Goodwin - Web page: https://patentgrep.com/patent/US10483107B2 ## CPC - H10P 76/00: Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography - G01D 5/38: by diffraction gratings - G02B 5/3083: {Birefringent or phase retarding elements (G02B5/3008, G02B5/3016 take precedence; systems for polarisation control G02B27/286; manufacturing phase modulating patterns by lithographic processes G03F7/001)} - G02B 13/14: for use with infrared or ultraviolet radiation ({G02B13/008, } G02B13/16 take precedence) - G02B 27/4255: {for alignment or positioning purposes (optical displacement encoding scales G01D5/347)} - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - G01D: MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS ## Abstract An encoder head configured for use with a lithographic exposure tool. The head is devoid of the multiplicity of optical corner-cubes and includes, instead, a single, geometrically substantially perfect cuboid of optically-isotropic material complemented, in operation, with prismatic elements made of optically anisotropic material to form a contraption that, as a unit, splits a single beam of light delivered to the contraption into four measurement (sub-)beams of light (two in xz-plane, two in yz-plane) and causes each of these sub-beams to interact with the wafer-stage diffraction grating at the same location upon the second pass by the grating as upon the first pass by the grating, thereby solving problems of (i) structural complexity of a conventional encoder head for use in an exposure tool, (ii) burdensome alignment of the multitude of optical prisms in the process of forming such encoder head, and (iii) cyclic non-linear errors associated with measurements involving conventional corner-cubes-based encoder heads while, at the same time, reducing the geometrical footprint of the encoder head. ## Claims ### Claim 1 An encoder head configured to detect a relative positional relationship of a workpiece with respect to a reference diffraction grating, the encoder head comprising: a first optical system configured to deliver a first beam of light with a first polarization state to a measurement position on the diffraction grating, wherein the diffraction grating is configured to form a second beam of light by diffracting the first beam of light; a plurality of birefringent members spatially separated from one another, wherein a birefringent member from said plurality is made from an optically-birefringent material and disposed in an optical path of the second beam of light; a reflector having a bottom surface and disposed to form a third beam of light by reflecting the second beam of light, that has passed through the birefringent member, back to the birefringent member to be transmitted through the birefringent member and to impinge at the measurement position on the diffraction grating, wherein the second beam of light has a second polarization state; and a wave plate disposed between the reflector and two birefringent members from said plurality, said wave plate being in contact with the bottom surface of the reflector at a location between said two birefringent members to intercept the third beam upon propagation of said third beam of light from the measurement position on the diffraction grating towards the reflector. ### Claim 2 (depends on 1) The encoder head according to claim 1, wherein the second polarization state is the same as the first polarization state. ### Claim 3 (depends on 2) The encoder head according to claim 2, wherein the wave plate is dimensioned to change the second polarization state to a third polarization state upon propagation of the second beam of light through the wave plate. ### Claim 4 (depends on 3) The encoder head according to claim 3, wherein the third beam of light has the third polarization state. ### Claim 5 (depends on 4) The encoder head according to claim 4, wherein the wave plate is dimensioned to change the third polarization state of the third beam of light to a fourth polarization state upon a transmission of the third beam of light through the wave plate, wherein the third polarization state and the fourth polarization state differ from one another. ### Claim 6 (depends on 1) The encoder head according to claim 1, wherein the wave plate is dimensioned to change a polarization state of a beam of light incident thereon obliquely. ### Claim 7 (depends on 6) The encoder head according to claim 6, wherein the wave plate is dimensioned to not change a polarization state of a beam of light incident thereon normally. ### Claim 8 (depends on 1) The encoder head of claim 1, wherein the reflector includes a retro-reflection member configured to form the third beam of light by retro-reflecting the second beam of light. ### Claim 9 (depends on 1) A stage assembly configured to move the workpiece and including a stage retaining the workpiece, and the encoder head according to claim 1 configured to measure said relative positional relationship. ### Claim 10 (depends on 9) An exposure apparatus including an illumination system; and the stage assembly according to claim 9 that, in operation, moves the stage relative to the illumination system. ### Claim 11 (depends on 10) A process for manufacturing a device, the process including providing a substrate; and forming an optical image on the substrate with the exposure apparatus according to claim 10.