# US 10,481,508 B2 · Exposure apparatus and method of manufacturing article > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,481,508 B2 - Document ID: US10481508B2 - Status: Granted - Kind: B2 - Application number: 16/243,200 - Filed: 2019-01-09 - Published: 2019-05-16 - Granted: 2019-11-19 - Earliest claimed: 2016-09-15 - Assignees: Canon Kabushiki Kaisha - Applicants: Canon Kabushiki Kaisha - Inventors: Takanori Sato - Web page: https://patentgrep.com/patent/US10481508B2 ## CPC - G03F 7/70775: {Position control, e.g. interferometers or encoders for determining the stage position} - G03F 7/70358: {Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging} - G03F 7/70641: {Focus} - G03F 7/70725: {control} - G03F 9/7023: {Aligning or positioning in direction perpendicular to substrate surface} - G03F 9/7026: {Focusing} - G01B 11/26: for measuring angles or tapers; for testing the alignment of axes - G03F 7/7085: {Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - G01B: MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ## Abstract The present invention provides an exposure apparatus which transfers a pattern of a mask onto a substrate by exposing the substrate while scanning the mask and the substrate, the apparatus including a stage configured to hold the substrate and move, a control unit configured to control movement of the stage, a first measurement unit configured to measure a position, in a height direction, of a shot region of the substrate held by the stage before the shot region reaches an exposure area where the shot region is exposed, and a second measurement unit configured to measure the position of the shot region in the height direction prior to the first measurement unit. ## Claims ### Claim 1 An exposure apparatus for transferring a pattern of a mask onto a substrate by exposing the substrate while scanning the mask and the substrate, the apparatus comprising: a stage configured to hold and move the substrate; a control unit configured to control movement of the stage; a first measurement unit configured to measure a position, in a height direction, of a shot region of the substrate held by the stage before the shot region reaches an exposure area where the shot region is exposed; and a second measurement unit configured to measure the position of the shot region in the height direction prior to the first measurement unit, wherein the control unit: controls the stage to perform: first driving where the substrate is driven in the height direction based on a measurement result of the second measurement unit; and second driving where the substrate is driven in the height direction based on a measurement result of the first measurement unit after the second measurement unit measures the position of the shot region in the height direction and until the shot region reaches the exposure area; makes a second driving amount of the stage in the height direction in the second driving smaller than a first driving amount of the stage in the height direction in the first driving; controls the stage so that the position of the shot region in the height direction is positioned at a first target position different from a second target position of the shot region in the height direction by the first driving and is positioned at the second target position by the second driving; and makes a time period required for the first driving from the position of the shot region in the height direction measured by the second measurement unit to the first target position shorter than a time period required for the second driving from the position of the shot region in the height direction measured by the first measurement unit to the second target position. ### Claim 2 (depends on 1) The apparatus according to claim 1, wherein the control unit: includes a PID controller configured to control driving of the stage in the height direction, makes a derivative gain of the PID controller in the first driving higher than a derivative gain of the PID controller in the second driving. ### Claim 3 (depends on 2) The apparatus according to claim 2, wherein the controller makes an integral gain of the PID controller in the first driving smaller than an integral gain of the PID controller in the second driving. ### Claim 4 (depends on 1) The apparatus according to claim 1, wherein the control unit: performs low-pass filter processing having a cutoff frequency on each of first difference data between the second target position and the position of the shot region in the height direction measured by the second measurement unit, and second difference data between the second target position and the position of the shot region in the height direction measured by the first measurement unit to generate control data for controlling driving of the stage in the height direction; and makes the cutoff frequency of the low-pass filter processing performed on the first difference data higher than the cutoff frequency of the low-pass filter processing performed on the second difference data. ### Claim 5 (depends on 1) The apparatus according to claim 1, wherein the control unit makes a maximum value of a change amount of the first driving amount of the stage with respect to a time period in the first driving larger than a maximum value of a change amount of the second driving amount of the stage with respect to a time period in the second driving. ### Claim 6 (depends on 1) The apparatus according to claim 1, further comprising: a projection optical system configured to project the pattern of the mask onto the substrate, wherein a position of an image plane of the projection optical system comes to the second target position. ### Claim 7 (depends on 1) The apparatus according to claim 1, wherein the first measurement unit and the second measurement unit have the same measurement accuracy in measurement of the position of the shot region in the height direction. ### Claim 8 (depends on 1) The apparatus according to claim 1, wherein the first measurement unit and the second measurement unit have the same configuration for measuring the position of the shot region in the height direction. ### Claim 9 A method of manufacturing an article, the method comprising the steps of: forming a pattern on a substrate using an exposure apparatus; and developing the exposed substrate to manufacture the article, wherein the exposure apparatus transfers a pattern of a mask onto the substrate by exposing the substrate while scanning the mask and the substrate, and includes: a stage configured to hold and move the substrate; a control unit configured to control movement of the stage; a first measurement unit configured to measure a position, in a height direction, of a shot region of the substrate held by the stage before the shot region reaches an exposure area where the shot region is exposed; and a second measurement unit configured to measure the position of the shot region in the height direction prior to the first measurement unit, wherein the control unit: controls the stage to perform: first driving where the substrate is driven in the height direction based on a measurement result of the second measurement unit; and second driving where the substrate is driven in the height direction based on a measurement result of the first measurement unit after the second measurement unit measures the position of the shot region in the height direction and until the shot region reaches the exposure area; makes a second driving amount of the stage in the height direction in the second driving smaller than a first driving amount of the stage in the height direction in the first driving; controls the stage so that the position of the shot region in the height direction is positioned at a first target position different from a second target position of the shot region in the height direction by the first driving and is positioned at the second target position by the second driving; and makes a time period required for the first driving from the position of the shot region in the height direction measured by the second measurement unit to the first target position shorter than a time period required for the second driving from the position of the shot region in the height direction measured by the first measurement unit to the second target position. ### Claim 10 An exposure apparatus for transferring a pattern of a mask onto a substrate by exposing the substrate, the apparatus comprising: a stage configured to hold and move the substrate; a control unit configured to control movement of the stage; a first measurement unit configured to measure a position, in a height direction, of a shot region of the substrate held by the stage before the shot region reaches an exposure area where the shot region is exposed; and a second measurement unit configured to measure the position of the shot region in the height direction prior to the first measurement unit, wherein the control unit: controls the stage to perform: first driving where the substrate is driven in the height direction based on a measurement result of the second measurement unit; and second driving where the substrate is driven in the height direction based on a measurement result of the first measurement unit after the second measurement unit measures the position of the shot region in the height direction and until the shot region reaches the exposure area; makes a second driving amount of the stage in the height direction in the second driving smaller than a first driving amount of the stage in the height direction in the first driving; controls the stage so that the position of the shot region in the height direction is positioned at a first target position different from a second target position of the shot region in the height direction by the first driving and is positioned at the second target position by the second driving; and makes a time period required for the first driving from the position of the shot region in the height direction measured by the second measurement unit to the first target position shorter than a time period required for the second driving from the position of the shot region in the height direction measured by the first measurement unit to the second target position. ### Claim 11 A method of manufacturing an article, the method comprising the steps of: forming a pattern on a substrate using an exposure apparatus; and developing the exposed substrate to manufacture the article, wherein the exposure apparatus transfers a pattern of a mask onto the substrate by exposing the substrate, and includes: a stage configured to hold and move the substrate; a control unit configured to control movement of the stage; a first measurement unit configured to measure a position, in a height direction, of a shot region of the substrate held by the stage before the shot region reaches an exposure area where the shot region is exposed; and a second measurement unit configured to measure the position of the shot region in the height direction prior to the first measurement unit, wherein the control unit: controls the stage to perform: first driving where the substrate is driven in the height direction based on a measurement result of the second measurement unit; and second driving where the substrate is driven in the height direction based on a measurement result of the first measurement unit after the second measurement unit measures the position of the shot region in the height direction and until the shot region reaches the exposure area; makes a second driving amount of the stage in the height direction in the second driving smaller than a first driving amount of the stage in the height direction in the first driving; controls the stage so that the position of the shot region in the height direction is positioned at a first target position different from a second target position of the shot region in the height direction by the first driving and is positioned at the second target position by the second driving; and makes a time period required for the first driving from the position of the shot region in the height direction measured by the second measurement unit to the first target position shorter than a time period required for the second driving from the position of the shot region in the height direction measured by the first measurement unit to the second target position.