# US 10,481,502 B2 · Object holder and lithographic apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,481,502 B2 - Document ID: US10481502B2 - Status: Granted - Kind: B2 - Application number: 15/918,478 - Filed: 2018-03-12 - Published: 2018-09-20 - Granted: 2019-11-19 - Earliest claimed: 2012-05-29 - Assignees: ASML Netherlands B.V. - Applicants: ASML Netherlands B.V. - Inventors: Thibault Simon Mathieu Laurent; Johannes Henricus Wilhelmus Jacobs; Wilhelmus Franciscus Johannes Simons; Martijn Houben; Raymond Wilhelmus Louis Lafarre; Koen Steffens; Han Henricus Aldegonda Lempens; Rogier Hendrikus Magdalena Cortie; Ruud Hendrikus Martinus Johannes Bloks; Gerben Pieterse; Siegfried Alexander Tromp; Theodorus Wilhelmus Polet; Jim Vincent Overkamp; Van Vuong Vy - Web page: https://patentgrep.com/patent/US10481502B2 ## CPC - G03F 7/70341: {Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041)} - G03F 7/70716: {Stages} - G03F 7/70875: {Temperature, e.g. temperature control of masks or workpieces via control of stage temperature} - G03F 7/7095: {Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient} - H10P 72/57: {Mask-wafer alignment} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway. ## Claims ### Claim 1 A moveable substrate table to support a substrate, the substrate table comprising: a support body having a support surface configured to hold the substrate on the substrate table; an opening adjacent an edge of the support surface; and a channel attached to the support body and in fluid communication with the opening via a passageway, wherein the channel is at least essentially thermally decoupled from the support body and from the passageway so that a thermal load in material defining the channel is essentially prevented from being transmitted to the support body and to the passageway. ### Claim 2 (depends on 1) The substrate table of claim 1, wherein the channel is defined by a first material which is different to a second material defining the passageway. ### Claim 3 (depends on 1) The substrate table of claim 1, wherein the channel is at least essentially thermally decoupled from the support body and from the passageway by a thermal barrier between the channel and the support body. ### Claim 4 (depends on 3) The substrate table of claim 3, wherein the thermal barrier comprises glue and/or an open gap between a structure of the channel and the support body. ### Claim 5 (depends on 1) The substrate table of claim 1, further comprising a barrier that substantially mechanically decouples material defining the channel from the support body and the passageway. ### Claim 6 (depends on 1) The substrate table of claim 1, wherein the channel is formed in a separate body from the support body. ### Claim 7 (depends on 1) The substrate table of claim 1, further comprising a heater or a sensor adjacent the channel. ### Claim 8 (depends on 1) A lithographic apparatus, comprising: the substrate table of claim 1; a projection system configured to project a radiation beam onto a substrate supported by the substrate table; and a liquid confinement structure configured to supply and at least partly confine a liquid to a space between the projection system and the substrate table. ### Claim 9 A moveable substrate table to support a substrate, the substrate table comprising: a support body having a support surface configured to hold the substrate on the substrate table; an opening adjacent an edge of the support surface; a channel in fluid communication with the opening via a passageway, the channel in a fixed position relative to the passageway; and a barrier that essentially mechanically decouples the material defining the channel from the support body and the passageway. ### Claim 10 (depends on 9) The substrate table of claim 9, wherein the channel is defined by a first material which is different to a second material defining the passageway. ### Claim 11 (depends on 9) The substrate table of claim 9, further comprising a thermal barrier between the channel and the support body. ### Claim 12 (depends on 9) The substrate table of claim 9, wherein the barrier comprises glue and/or an open gap. ### Claim 13 (depends on 9) The substrate table of claim 9, wherein the channel is formed in a separate body from the support body. ### Claim 14 (depends on 9) The substrate table of claim 9, wherein barrier is located at a vertical extending surface of the structure defining the channel. ### Claim 15 (depends on 9) The substrate table of claim 9, further comprising a heater or a sensor adjacent the channel. ### Claim 16 (depends on 1) A lithographic apparatus, comprising: the substrate table of claim 1; a pattern transfer system configured to transfer a pattern onto a substrate supported by the substrate table; and a liquid confinement structure configured to supply and at least partly confine a liquid to a space between the pattern transfer system and the substrate table. ### Claim 17 A method of operating an immersion lithographic apparatus, the method comprising: providing a liquid onto an object supported by a table; removing liquid from an edge of the object through an opening in fluid communication with a channel attached to the table, via a passageway, wherein the channel is at least essentially thermally decoupled from the support body and from the passageway so that a thermal load in material defining the channel is essentially prevented from being transmitted to the support body and to the passageway. ### Claim 18 (depends on 17) The method of claim 17, wherein the channel is defined by a first material which is different to a second material defining the passageway. ### Claim 19 (depends on 17) The method of claim 17, wherein the channel is at least essentially thermally decoupled from the support body and from the passageway by a thermal barrier between the channel and the support body. ### Claim 20 (depends on 17) The method of claim 17, further comprising substantially mechanically decoupling material defining the channel from the support body and the passageway using a barrier.