# US 10,481,494 B1 · Coating compositions for use with an overcoated photoresist

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- Number: US 10,481,494 B1
- Document ID: US10481494B1
- Status: Granted
- Kind: B1
- Application number: 14/635,553
- Filed: 2015-03-02
- Granted: 2019-11-19
- Earliest claimed: 2010-12-31
- Assignees: Rohm and Haas Electronic Materials LLC
- Applicants: Rohm and Haas Electronic Materials LLC
- Inventors: Vipul Jain; Owendi Ongayi; Suzanne Coley; Anthony Zampini
- Web page: https://patentgrep.com/patent/US10481494B1

## CPC

- G03F 7/09: characterised by structural details, e.g. supports, auxiliary layers (supports for printing plates in general B41N)
- G03F 7/039: Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023)
- G03F 7/0392: {the macromolecular compound being present in a chemically amplified positive photoresist composition}
- G03F 7/091: {characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement}
- G03F 7/092: {characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means}
- G03F 7/094: {Multilayer resist systems, e.g. planarising layers}
- G03F 7/11: having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)}
- G03F 7/16: Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74)
- G03F 7/30: Imagewise removal using liquid means
- G03F 7/322: {Aqueous alkaline compositions}
- Y10T 428/31786: Of polyester [e.g., alkyd, etc.]
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

## Claims

### Claim 1

A coated substrate comprising:
(a) a layer of a coating composition on a substrate, the coating composition comprising a polyester resin that comprises 1) one or more polymerized parabanic diacetate groups and 2) one or more cyanurate groups; and
(b) a photoresist layer over the coating composition layer.

### Claim 2 (depends on 1)

The substrate of claim 1 wherein the resin further comprises one or more uracil groups.

### Claim 3

A method of forming a photoresist relief image, comprising:
(a) applying a coating composition on a substrate, the coating composition comprising polyester resin that comprises 1) one or more polymerized parabanic diacetate groups and 2) one or more cyanurate groups;
(b) applying a photoresist composition above the coating composition layer; and
(c) exposing and developing the photoresist layer to provide a resist relief image.

### Claim 4 (depends on 3)

The method of claim 3 wherein the coating composition comprises a component that comprises anthracene groups.

### Claim 5 (depends on 3)

The method of claim 3 wherein the photoresist is exposed with 193 nm radiation.

### Claim 6 (depends on 3)

The method of claim 3 wherein the applied coating composition is crosslinked prior to applying the photoresist composition.

### Claim 7 (depends on 3)

The method of claim 3 wherein the coating composition comprises a component that comprises phenyl groups.

### Claim 8

An antireflective composition for use with an overcoated photoresist composition, the antireflective composition comprising a polyester resin that comprises 1) one or more parabanic acid moieties and 2) one or more polymerized tris(hydroxyl ethyl)isocyanurate groups.

### Claim 9 (depends on 8)

The antireflective composition of claim 8 wherein the resin comprises phenyl groups.

### Claim 10 (depends on 8)

The antireflective composition of claim 8 wherein the antireflective composition comprises a crosslinker component.

### Claim 11 (depends on 8)

The antireflective composition of claim 8 wherein the antireflective composition comprises a component that comprises anthracene groups.

### Claim 12 (depends on 8)

The antireflective composition of claim 8 wherein the polyester resin comprises polymerized parabanic diacetate compounds.