# US 10,481,490 B2 · Imprint apparatus, and method of manufacturing article

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 10,481,490 B2
- Document ID: US10481490B2
- Status: Granted
- Kind: B2
- Application number: 15/345,205
- Filed: 2016-11-07
- Published: 2017-05-11
- Granted: 2019-11-19
- Earliest claimed: 2015-11-09
- Assignees: Canon Kabushiki Kaisha
- Applicants: Canon Kabushiki Kaisha
- Inventors: Keiji Yamashita
- Web page: https://patentgrep.com/patent/US10481490B2

## CPC

- B29C 43/56: Compression moulding under special conditions, e.g. vacuum
- B29C 33/40: Plastics, e.g. foam or rubber
- B29C 43/021: {characterised by the shape of the surface}
- G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}
- H10P 72/0428: {Apparatus for mechanical treatment or grinding or cutting}
- H10P 95/08: {Planarisation of organic insulating materials}
- B29C 2043/025: {forming a microstructure, i.e. fine patterning}
- B29C 2043/566: {in a specific gas atmosphere, with or without pressure}
- B29K 2995/0026: Transparent
- B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00)
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- B29K: INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR {MOULDS, } REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS

## Abstract

An imprint apparatus performs pressing of an imprint material on a substrate with a mold to form a pattern on the substrate. The imprint apparatus includes a supply device configured to supply a condensable gas to a space between the imprint material and the mold. The condensable gas is liquefied by the pressing. The apparatus further includes a pipe for transferring the condensable gas in a gas state to the supply device and a storage connected to the pipe. The storage stores the condensable gas in a liquid state. The supply device is configured to supply the condensable gas vaporized in the storage and transferred through the pipe from the storage.

## Claims

### Claim 1

An apparatus that cures an uncured material on a substrate in a state of bringing a member and the uncured material into contact with each other, the apparatus comprising:
a gas supply device configured to supply a condensable gas to a space between the uncured material and the member, the condensable gas being liquefied by pressing;
a pipe for transferring the condensable gas in a gas state to the gas supply device; and
a storage connected to the pipe, the storage storing the condensable gas in a liquid state,
wherein the gas supply device is configured to supply the condensable gas vaporized in the storage and transferred through the pipe from the storage.

### Claim 2 (depends on 1)

The apparatus according to claim 1, wherein the apparatus is configured to satisfy an inequality:
Ps−P0≥λ·(L/D)·(γV2)/2,
where Ps denotes a saturated vapor pressure of the condensable gas in the pipe, P0 denotes an atmospheric pressure, λ denotes a friction coefficient of the pipe, D denotes an inner diameter of the pipe, γ denotes a density of the condensable gas in the pipe, V denotes a flow velocity of the condensable gas in the pipe, and L denotes a length of the pipe.

### Claim 3 (depends on 1)

The apparatus according to claim 1, further comprising:
a pipe for transferring the condensable gas in the liquid state to the storage.

### Claim 4 (depends on 3)

The apparatus according to claim 3, further comprising:
a filter disposed in the pipe for transferring the condensable gas to the storage, the filter filtering the condensable gas in the liquid state.

### Claim 5 (depends on 1)

The apparatus according to claim 1, further comprising:
a temperature regulator configured to perform temperature regulation in the storage.

### Claim 6 (depends on 1)

The apparatus according to claim 1, wherein the storage is disposed at a position higher than that of the gas supply device.

### Claim 7 (depends on 1)

The apparatus according to claim 1, further comprising:
a gas recovery device configured to recover the condensable gas supplied by the gas supply device to the space between the uncured material and the member; and
a container configured to contain the condensable gas recovered by the gas recovery device.

### Claim 8 (depends on 1)

The apparatus according to claim 1, wherein the condensable gas has a boiling point within a range from −10° C. to 23° C.

### Claim 9 (depends on 1)

The apparatus according to claim 1, wherein the condensable gas has a saturated vapor pressure within a range from 0.1 MPa to 0.4 MPa.