# US 10,481,488 B2 · Mask blank substrate processing device, mask blank substrate processing method, mask blank substrate fabrication method, mask blank fabrication method, and transfer mask fabrication method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,481,488 B2 - Document ID: US10481488B2 - Status: Granted - Kind: B2 - Application number: 14/654,753 - Filed: 2013-12-24 - Published: 2015-12-24 - Granted: 2019-11-19 - Earliest claimed: 2012-12-27 - Assignees: Hoya Corporation - Applicants: Hoya Corporation - Inventors: Takeyuki Yamada; Toshihiko Orihara; Takahito Nishimura - Web page: https://patentgrep.com/patent/US10481488B2 ## CPC - G03F 1/60: Substrates - B24B 29/02: designed for particular workpieces - C03C 15/00: Surface treatment of glass, not in the form of fibres or filaments, by etching (etching or surface-brightening compositions, in general C09K13/00) - C03C 23/0075: {Cleaning of glass (specially adapted to plate glass B08B11/00)} - G03F 1/24: Reflection masks; Preparation thereof - G03F 1/80: Etching - G03F 1/82: Auxiliary processes, e.g. cleaning or inspecting - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - B24B: MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING (grinding of gear teeth B23F, of screw-threads B23G1/36; by electro-erosion B23H; abrasive or related blasting B24C; tools for grinding, buffing or sharpening B24D; polishing compositions C09G1/00; abrasives C09K3/14; electrolytic etching or polishing C25F3/00; grinding arrangements for use on assembled railway tracks E01B31/17); DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS - C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS ## Abstract Provided are a mask blank substrate processing device, a mask blank substrate processing method, a mask blank substrate fabrication method, a mask blank fabrication method, and a transfer mask fabrication method, for surface processing a mask blank substrate such that a high-level smoothness and a low-defect quality are satisfied. A mask blank substrate processing device (1) comprises: substrate support means (3) for supporting a substrate (Y); a catalytic surface plate (4) comprising a catalytic face (4a) which is positioned opposite the principal surface of the substrate (Y); relative movement means (5) for causing the catalytic face (4a) and the principal surface to move relative to each other in a state of being either in contact or in close proximity; first processing fluid supply means (6) which supplies a first processing fluid for CARE to the principal surface; and physical cleaning means (7) for removing foreign matter which has adhered to the principal surface from the principal surface, using a physical action. ## Claims ### Claim 1 A mask blank substrate processing method including supplying a processing fluid to a mask blank substrate to process the mask blank substrate, the mask blank substrate processing method comprising: conducting a Catalyst Referred Etching, including supplying and contacting a first processing fluid to a principal surface of the substrate, and with a catalytic face of a catalytic surface plate in contact with the principal surface or in contact with the first processing fluid on the principal surface, causing the substrate and the catalytic face to move relative to each other so as to subject the principal surface to Catalyst Referred Etching; and after the Catalyst Referred Etching, conducting a physical cleaning for removing foreign matters attached to the principal surface using a physical action, wherein the substrate is a glass substrate, wherein the physical cleaning is at least one cleaning selected from the group consisting of megasonic cleaning and brush cleaning, wherein the physical cleaning is conducted by supplying a second processing fluid to the principal surface, and wherein the second processing fluid for the megasonic cleaning and the brush cleaning contains at least one selected from the group consisting of ozone water, hydrogen water, and neutral detergent. ### Claim 2 (depends on 1) The mask blank substrate processing method according to claim 1, wherein a chemical cleaning is conducted before the Catalyst Referred Etching. ### Claim 3 (depends on 1) The mask blank substrate processing method according to claim 1, wherein the first processing fluid is pure water, ozone water, or hydrogen water. ### Claim 4 (depends on 1) The mask blank substrate processing method according to claim 1, wherein the first processing fluid and the second processing fluid are the same processing fluid. ### Claim 5 (depends on 1) The mask blank substrate processing method according to claim 1, wherein an additional physical cleaning is conducted before the Catalyst Referred Etching. ### Claim 6 (depends on 5) The mask blank substrate processing method according to claim 5, wherein the additional physical cleaning is conducted by supplying a third processing fluid including a chemical solution to the principal surface. ### Claim 7 (depends on 1) The mask blank substrate processing method according to claim 1 wherein a mask blank is fabricated by forming a transfer pattern forming film on a principal surface of the mask blank substrate resulting in a mask blank. ### Claim 8 (depends on 7) The mask blank substrate processing method according to claim 7, further comprising: patterning the transfer pattern forming film of the mask blank to form a transfer pattern on the principal surface, resulting in a transfer mask. ### Claim 9 (depends on 1) The mask blank substrate processing method according to claim 1, wherein the physical cleaning at least comprises megasonic cleaning. ### Claim 10 (depends on 9) The mask blank substrate processing method according to claim 9, wherein the second processing fluid for the megasonic cleaning is hydrogen water. ### Claim 11 (depends on 1) The mask blank substrate processing method according to claim 1, wherein the physical cleaning at least comprises brush cleaning. ### Claim 12 (depends on 11) The mask blank substrate processing method according to claim 11, wherein the physical cleaning further comprises megasonic cleaning. ### Claim 13 (depends on 12) The mask blank substrate processing method according to claim 12, wherein the physical cleaning further comprises two fluid nozzle cleaning. ### Claim 14 (depends on 11) The mask blank substrate processing method according to claim 11, wherein the second processing fluid for the brush cleaning is neutral detergent. ### Claim 15 (depends on 14) The mask blank substrate processing method according to claim 14, wherein the physical cleaning further comprises megasonic cleaning, and wherein the second processing fluid for the megasonic cleaning is hydrogen water. ### Claim 16 (depends on 15) The mask blank substrate processing method according to claim 15, wherein the physical cleaning is conducted by the brush cleaning, the megasonic cleaning, and two fluid nozzle cleaning in this sequence. ### Claim 17 A fabrication method of a substrate with a multilayer reflective film, comprising: conducting a Catalyst Referred Etching, including supplying and contacting a first processing fluid to a principal surface of the substrate, and with a catalytic face of a catalytic surface plate in contact with the principal surface or in contact with the first processing fluid on the principal surface, causing the substrate and the catalytic face to move relative to each other so as to subject the principal surface to Catalyst Referred Etching; and after the Catalyst Referred Etching, conducting a physical cleaning for removing foreign matters attached to the principal surface using a physical action, wherein the substrate is a glass substrate, wherein the physical cleaning is at least one cleaning selected from the group consisting of megasonic cleaning and brush cleaning, wherein the physical cleaning is conducted by supplying a second processing fluid to the principal surface, and wherein the second processing fluid for the megasonic cleaning and the brush cleaning contains at least one selected from the group consisting of ozone water, hydrogen water, and neutral detergent; and forming a multilayer reflective film including a first layer with a first refractive index and a second layer with a second refractive index lower than the first refractive index laminated alternately on a principal surface of the mask blank substrate, wherein the multilayer reflective film is formed by an ion beam sputtering using a target of a first material for the first refractive index and a second material for the second refractive index by allowing sputter particles of the first material and the second material to enter at an incident angle between 0 and 30 degrees, both inclusive, with respect to a normal line of the principal surface. ### Claim 18 (depends on 17) The method of claim 17, wherein a mask blank is fabricated by forming a transfer pattern forming film on the substrate with the multilayer reflective film. ### Claim 19 (depends on 18) The method of claim 18, wherein a transfer mask is fabricated by patterning to form a transfer pattern on the principal surface.