# US 10,481,317 B2 · Nanograting method and apparatus

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- Number: US 10,481,317 B2
- Document ID: US10481317B2
- Status: Granted
- Kind: B2
- Application number: 15/683,706
- Filed: 2017-08-22
- Published: 2018-03-01
- Granted: 2019-11-19
- Earliest claimed: 2016-08-22
- Assignees: Magic Leap, Inc.
- Applicants: Magic Leap, Inc.
- Inventors: Christophe Peroz; Mauro Melli; Vikramjit Singh; David Jurbergs; Jeffrey Dean Schmulen; Zongxing Wang; Shuqiang Yang; Frank Y. Xu; Kang Luo; Marlon Edward Menezes; Michael Nevin Miller
- Web page: https://patentgrep.com/patent/US10481317B2

## CPC

- G02B 6/0016: {Grooves, prisms, gratings, scattering particles or rough surfaces}
- G02B 1/002: {made of materials engineered to provide properties not available in nature, e.g. metamaterials}
- G02B 5/1823: {in an overlapping or superposed manner}
- G02B 5/1857: {using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams}
- G02B 5/1866: {Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials (G02B5/1809, G02B5/1828, G02B5/1833, G02B5/1838 and G02B5/1847 take precedence)}
- G02B 5/1871: {Transmissive phase gratings}
- G02B 5/3025: {Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state (G02B5/3008, G02B5/3016 take precedence)}
- G02B 6/0023: {provided by one optical element, or plurality thereof, placed between the light guide and the light source, or around the light source}
- G02B 6/0035: {provided on the surface of the light guide or in the bulk of it}
- G02B 6/0036: {2-D arrangement of prisms, protrusions, indentations or roughened surfaces}
- G02B 6/0038: {Linear indentations or grooves, e.g. arc-shaped grooves or meandering grooves, extending over the full length or width of the light guide}
- G02B 6/005: {provided by one optical element, or plurality thereof, placed on the light output side of the light guide}
- G02B 6/0076: {Stacked arrangements of multiple light guides of the same or different cross-sectional area}
- G02B 7/008: {with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation}
- G02B 27/0018: {with means for preventing ghost images (anti-reflection coatings G02B1/11)}
- G02B 27/0081: {with means for altering, e.g. enlarging, the entrance or exit pupil}
- G02B 27/017: {Head mounted}
- G02B 27/0172: {characterised by optical features}
- G02B 27/0176: {characterised by mechanical features}
- G02B 27/1086: {operating by diffraction only}
- G02B 27/283: {used for beam splitting or combining}
- G02C 5/16: resilient or with resilient parts
- G02C 11/10: {Electronic devices other than hearing aids}
- G06F 1/163: {Wearable computers, e.g. on a belt}
- G06F 1/203: {for portable computers, e.g. for laptops}
- G06F 1/206: {comprising thermal management}
- G06F 3/011: {Arrangements for interaction with the human body, e.g. for user immersion in virtual reality (blind teaching G09B21/00)}
- G06F 3/013: {Eye tracking input arrangements (G06F3/015 takes precedence)}
- G06F 3/147: using display panels
- G09G 3/001: {using specific devices not provided for in groups G09G3/02 - G09G3/36, e.g. using an intermediate record carrier such as a film slide; Projection systems; Display of non-alphanumerical information, solely or in combination with alphanumerical information, e.g. digital display on projected diapositive as background (slide projectors per se G03B23/00 = 42 HP)}
- G09G 3/002: {to project the image of a two-dimensional display, such as an array of light emitting or modulating elements or a CRT}
- G09G 3/2003: {Display of colours (specific for liquid crystal displays G09G3/3607)}
- G09G 3/2044: {using dithering}
- H04N 9/3102: {using two-dimensional electronic spatial light modulators (micromechanical modulators as such G02B26/0833; liquid crystal modulators as such G02F1/13)}
- H04N 9/3164: {using multiple light sources}
- H05K 7/20963: {Heat transfer by conduction from internal heat source to heat radiating structure (H05K7/20972 takes precedence)}
- B29D 11/00769: {Producing diffraction gratings}
- G02B 6/29325: {of the slab or planar or plate like form, i.e. confinement in a single transverse dimension only (integrated circuit planar waveguide arrangements G02B6/12007; specially adapted for lighting G02B6/0011)}
- G02B 6/34: utilising prism or grating {(G02B6/293 takes precedence)}
- G02B 27/30: Collimators
- G02B 2027/0114: {comprising dichroic elements}
- G02B 2027/0118: {comprising devices for improving the contrast of the display / brillance control visibility}
- G02B 2027/012: {comprising devices for attenuating parasitic image effects}
- G02B 2027/0125: {Field-of-view increase by wavefront division}
- G02B 2027/014: {comprising information/image processing systems}
- G02B 2027/0174: {holographic}
- G02B 2027/0178: {Eyeglass type (eyeglass details G02C)}
- G09G 2320/0233: Improving the luminance or brightness uniformity across the screen
- G09G 2330/045: Protection against panel overheating
- G09G 2340/0464: Positioning
- H04N 9/3144: {Cooling systems (cooling of liquid crystal cells in general G02F1/133382; cooling of projectors not peculiar to the presence of an electronic spatial light modulator G03B21/16)}
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02C: SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES (trial frames for testing the eyes A61B3/04; goggles or eyeshields not having the same features as spectacles A61F9/00)
- G06F: ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models G06N)
- G09G: ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION (arrangements for transferring data between digital computers and displays G06F3/14; static indicating arrangements comprising an association of a number of separate sources or light control cells G09F9/00; static indicating arrangements comprising integral associations of a number of light sources H01J, H01K, H10H, H05B33/12; scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission, details thereof H04N1/00)
- H04N: PICTORIAL COMMUNICATION, e.g. TELEVISION
- H05K: PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- B29D: PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE (making granules B29B9/00; making preforms B29B11/00)

## Abstract

A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region.

## Claims

### Claim 1

A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure, the method comprising:
cutting a substrate off-axis;
depositing a first layer on the substrate;
depositing a resist layer on the first layer, wherein the resist layer includes a pattern;
etching the first layer in the pattern using the resist layer as a mask, wherein the pattern includes a first region and a second region;
removing the resist layer;
coating a first polymer layer in the first region of the pattern;
etching the substrate in the second region of the pattern, creating the binary grating structure in the substrate in the second region;
removing the first polymer layer;
coating a second polymer layer in the second region of the pattern;
etching the substrate in the first region of the pattern, creating the blazed grating structure in the substrate in the first region;
removing the second polymer layer; and
removing the first layer from the substrate.

### Claim 2 (depends on 1)

The method of claim 1, wherein the substrate comprises silicon.

### Claim 3 (depends on 1)

The method of claim 1, wherein the first layer comprises silicon dioxide.

### Claim 4 (depends on 1)

The method of claim 1, wherein the resist layer is deposited using lithography.

### Claim 5 (depends on 1)

The method of claim 1, wherein etching the substrate in the second region of the pattern includes dry etching the substrate.

### Claim 6 (depends on 1)

The method of claim 1, further comprising:
depositing a metal layer on the second polymer layer in the second region of the pattern.

### Claim 7 (depends on 6)

The method of claim 6, wherein the metal layer comprises titanium.

### Claim 8 (depends on 6)

The method of claim 6, wherein the metal layer is deposited using physical vapor deposition.

### Claim 9 (depends on 6)

The method of claim 6, further comprising:
removing the metal layer after etching the substrate in the first region of the pattern.

### Claim 10 (depends on 1)

The method of claim 1, wherein etching the substrate in the first region of the pattern comprises wet etching the substrate in the first region of the pattern.

### Claim 11 (depends on 10)

The method of claim 10, wherein the substrate is wet etched using potassium hydroxide.

### Claim 12 (depends on 1)

The method of claim 1, further comprising:
trimming the blazed grating structure in the substrate in the first region.