System and method for non-contact measurement of optoelectronic properties of thin film
AssigneeKorea Institute of Science and Technology
InventorsMinah Seo, Sanghun Lee, Chulki Kim, Q-Han Park, Jongho Choe, Jinsoo Kim
Life of this patent
Estimating the term…
Abstract
Disclosed herein is a system for non-contact measurement of an optoelectronic property. The system includes a sensing element configured to amplify an electromagnetic wave having a specific frequency, a thin film disposed on the sensing element such that an optoelectronic property of the thin film is measured, and an optoelectronic property measuring server configured to extract a physical property of the thin film based on the optoelectronic property of the thin film obtained when the electromagnetic wave amplified by the sensing element passes through the thin film.
Claims15
A system for non-contact measurement of an optoelectronic property, the system comprising:
- a sensing device configured to amplify an electromagnetic wave having a specific frequency, the sensing device including
- a substrate, and
- a film disposed on the substrate, wherein the film comprises a patterned rectangular slot engraved in the film or a patterned rectangular structure embossed on the film to amplify the electromagnetic wave having the specific frequency, wherein material characteristic of the substrate is different from material characteristic of the film;
- a thin film disposed over the sensing device to measure an optoelectronic property of the thin film;
- and
- an optoelectronic property measuring server configured to extract a physical property of the thin film based on the optoelectronic property of the thin film obtained in response to detection of amplification of the electromagnetic wave amplified by the sensing device passes through the thin film.
A method for non-contact measurement of an optoelectronic property performed in a system for non-contact measurement of an optoelectronic property, the method comprising:
- measuring an optoelectronic property of a thin film obtained when an electromagnetic wave amplified by a sensing device by amplifying an electromagnetic wave having a specific frequency, passes through the thin film disposed over the sensing device;
- and
- extracting a physical property of the thin film based on the measured optoelectronic property, wherein the sensing device includes
- a substrate, and
- a film disposed on the substrate, wherein the film comprises a patterned rectangular slot engraved in the film or a patterned rectangular structure embossed on the film to amplify the electromagnetic wave having the specific frequency, wherein material characteristic of the substrate is different from the material characteristic of the film.
Dependencies are inferred from the claim text.