# US 10,480,072 B2 · Semiconductor processing reactor and components thereof

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- Number: US 10,480,072 B2
- Document ID: US10480072B2
- Status: Granted
- Kind: B2
- Application number: 15/182,504
- Filed: 2016-06-14
- Published: 2016-10-06
- Granted: 2019-11-19
- Earliest claimed: 2009-04-06
- Assignees: ASM IP Holding B.V.
- Applicants: Asm IP Holding, B.V.
- Inventors: Eric James Shero; Mohith E. Verghese; Carl Louis White; Herbert Terhorst; Dan Maurice
- Web page: https://patentgrep.com/patent/US10480072B2

## CPC

- C23C 16/45502: {Flow conditions in reaction chamber}
- C23C 16/45504: {Laminar flow}
- C23C 16/45544: {characterized by the apparatus}
- H10P 14/6339: {deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD}
- C23C 16/45525: {Atomic layer deposition [ALD]}
- C23C 16/45561: {Gas plumbing upstream of the reaction chamber}
- C23C 16/45591: {Fixed means, e.g. wings, baffles}
- Y10T 137/85938: Non-valved flow dividers
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.

## Claims

### Claim 1

A diffuser for distributing at least one process gas, said diffuser comprising:
an inlet portion having a channel formed therethrough for receiving said at least one process gas; and
a distribution portion coupled to said inlet portion, said distribution portion comprising a mounting surface disposed on a mounting surface plane, wherein a first distribution surface, a second distribution surface, a third distribution surface, and deflecting surface of the distribution portion define at least one boundary of a diffuser volume,
wherein said first, second, and third distribution surfaces, and the deflecting surface extend between a first curved side surface, a second curved side surface, and a third curved side surface, wherein a plurality of lateral boundaries of the diffuser volume is defined by the first curved side surface, the second curved side surface, and the third curved side surface, wherein the third curved side surface extends between the first curved side surface and the second curved side surface, and wherein a centerline splits the third curved side surface and the first, second, and third distribution surfaces,
wherein the third distribution surface comprises a slope in a lateral direction from the centerline toward each of the first curved side surface and the second curved side surface, such that the third distribution surface proximate each of the first curved side surface and the second curved side surface is spaced further from the mounting surface plane than the third distribution surface proximate the centerline,
and wherein said first and second side surfaces extend between, on one side, said first, second, and third distribution surfaces and the deflecting surface, and on another side, said mounting surface.

### Claim 2 (depends on 1)

The diffuser of claim 1, wherein said first distribution surface is adjacent to said inlet portion, said second distribution surface is adjacent to said first distribution surface, said third distribution surface is adjacent to said second distribution surface, and said deflecting surface is adjacent to said third distribution surface.

### Claim 3 (depends on 1)

The diffuser of claim 1, wherein said first distribution surface is sloped about 4° downward toward the third curved side surface with respect to said mounting surface plane, said second distribution surface is sloped about 10° downward toward the third curved side surface with respect to said mounting surface plane, and said deflecting surface is sloped about 26° downward toward the third curved side surface with respect to said mounting surface plane.

### Claim 4 (depends on 1)

The diffuser of claim 1, wherein said third distribution surface has a constant slope between said centerline and said first and second side surfaces.

### Claim 5 (depends on 1)

The diffuser of claim 1, wherein the third distribution surface at the centerline is vertically spaced apart from the mounting surface plane between about 1.0 mm and 3.0 mm, and the third distribution surface adjacent to said first and second side surfaces is vertically spaced apart from the mounting surface plane between about 3.0 mm and 5.0 mm.

### Claim 6 (depends on 1)

The diffuser of claim 1, wherein the third distribution surface at said centerline is vertically spaced apart from said mounting surface plane about 2.24 mm, and said third distribution surface adjacent to said first and second side surfaces is vertically spaced apart from said mounting surface plane between about 4.0 mm.

### Claim 7 (depends on 1)

The diffuser of claim 1, wherein the inlet portion comprises a first inlet surface having a substantially conical shape.

### Claim 8 (depends on 7)

The diffuser of claim 7, wherein the inlet portion comprises a second inlet surface having a substantially cylindrical shape.

### Claim 9 (depends on 7)

The diffuser of claim 7, wherein the inlet portion comprises a second inlet surface having a substantially conical shape.

### Claim 10 (depends on 1)

The diffuser of claim 1, wherein the first distribution surface and the second distribution surface have a decreasing height moving toward the third curved side surface relative to the mounting surface plane.

### Claim 11 (depends on 1)

The diffuser of claim 1, wherein said first distribution surface is sloped between about between about 3-7 degrees downward toward the third curved side surface with respect to said mounting surface plane.

### Claim 12 (depends on 1)

The diffuser of claim 1, wherein said second distribution surface is sloped between about between about between about 5-20 degrees downward toward the third curved side surface with respect to said mounting surface plane.