# US 10,480,071 B2 · Continuous distillation trichlorosilane vaporization supply apparatus

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- Number: US 10,480,071 B2
- Document ID: US10480071B2
- Status: Granted
- Kind: B2
- Application number: 14/907,603
- Filed: 2014-07-22
- Published: 2016-05-12
- Granted: 2019-11-19
- Earliest claimed: 2013-07-26
- Assignees: Techno Boundary Co.
- Applicants: Techno Boundary Co.
- Inventors: Shinji Maruya
- Web page: https://patentgrep.com/patent/US10480071B2

## CPC

- C23C 16/4482: {by bubbling of carrier gas through liquid source material}
- B01D 5/0057: {in combination with other processes}
- C30B 25/14: Feed and outlet means for the gases; Modifying the flow of the reactive gases
- C30B 29/06: Silicon
- C30B 35/007: {Apparatus for preparing, pre-treating the source material to be used for crystal growth}
- G05B 15/02: electric
- F17C 9/02: with change of state, e.g. vaporisation
- H10P 14/24: using chemical vapour deposition [CVD]
- H10P 14/3411: {Silicon, silicon germanium or germanium}
- Y02E 60/32: Hydrogen storage
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- B01D: SEPARATION (separating solids from solids by wet methods B03B, B03D; by pneumatic jigs or tables B03B; by other dry methods B07; magnetic or electrostatic separation of solid materials from solid materials or fluids, separation by high-voltage electric fields B03C; centrifuges, vortex apparatus B04; presses per se for squeezing-out liquid from liquid-containing material B30B9/02; treatment of water C02F, e.g. softening by ion-exchange C02F1/42; {arrangements of air intake cleaners in gas turbine plants F02C7/05} ; arrangements or mounting of filters in air-conditioning, air-humidification or ventilation F24F13/28)
- C30B: SINGLE-CRYSTAL GROWTH (by using ultra-high pressure, e.g. for the formation of diamonds, B01J3/06); UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL (zone-refining of metals or alloys C22B); PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE (casting of metals, casting of other substances by the same processes or devices B22D; working of plastics B29; modifying the physical structure of metals or alloys C21D, C22F); SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE (for producing semiconductor devices or parts thereof H10); APPARATUS THEREFOR
- G05B: CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS (systems for controlling or regulating non-electric variables G05D; systems for regulating electric or magnetic variables G05F; control devices or systems insofar as characterised by mechanical features only G05G)
- F17C: VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES (storing fluids in natural or artificial cavities or chambers in the earth B65G5/00; construction or assembling of bulk storage containers employing civil-engineering techniques E04H7/00; variable-capacity gas-holders F17B; liquefaction or refrigeration machines, plants, or systems F25)
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- Y02E: REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION

## Abstract

A continuous distillation-type trichlorosilane vaporization supply apparatus includes an evaporator including an introduction port for hydrogen gas as a carrier gas and having a heater that vaporizes liquid trichlorosilane; and a condenser including a cooling device to condense liquid at a temperature corresponding to a saturated vapor pressure, which is lower than a vapor pressure of the vaporized trichlorosilane gas, wherein a center line of the evaporator and a center line of the condenser are not on the same line, and a lower end of the condenser has a structure that communicates with a lower end of the evaporator through a pipe.

## Claims

### Claim 1

A continuous distillation trichlorosilane vaporization supply apparatus comprising:
an evaporator including an introduction port for hydrogen gas as a carrier gas and having a heater that vaporizes liquid trichlorosilane;
a carrier hydrogen gas supply pipe connected to the evaporator; and
a condenser that condenses liquid at a temperature corresponding to a saturated vapor pressure, which is lower than a vapor pressure of the vaporized trichlorosilane gas,
wherein a center line of the evaporator and a center line of the condenser are not on the same line,
a lower end of the condenser has a structure that directly communicates with a lower end of the evaporator through a pipe,
an upper end of the condenser is provided with a gas feeding pipe,
the liquid trichlorosilane passes through a trichlorosilane replenishing valve and replenishes the evaporator,
the carrier hydrogen gas supply pipe and the trichlorosilane supply valve are different structures,
the upper end of the condenser is provided with a distribution plate that distributes the trichlorosilane-hydrogen mixed gas that has passed through the condenser to a plurality of devices, and
an inside of a single condenser is divided in plural sections.

### Claim 2 (depends on 1)

The apparatus according to claim 1, further comprising:
a temperature control mechanism of the condenser; and
a pressure adjusting mechanism of the condenser.

### Claim 3 (depends on 1)

The apparatus according to claim 1,
wherein the condenser includes a plurality of gas conduction pipes, and
the distribution plate includes barriers that partition outlets of the plurality of gas conduction pipes into the plurality of devices.

### Claim 4 (depends on 3)

The apparatus according to claim 3, further comprising a plurality of adjusted and mixed gas feeding pipes that feed the trichlorosilane to the plurality of devices and connect to each of the outlets of the plurality of gas conduction pipes that are partitioned.
