# US 10,480,068 B2 · Chamber liner for high temperature processing > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,480,068 B2 - Document ID: US10480068B2 - Status: Granted - Kind: B2 - Application number: 15/434,853 - Filed: 2017-02-16 - Published: 2017-09-28 - Granted: 2019-11-19 - Earliest claimed: 2016-03-25 - Assignees: Applied Materials, Inc. - Applicants: Applied Materials, Inc. - Inventors: Sanjeev Baluja; Ren-Guan Duan; Kalyanjit Ghosh - Web page: https://patentgrep.com/patent/US10480068B2 ## CPC - C23C 16/4401: {Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber} - C23C 16/45587: {Mechanical means for changing the gas flow} - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract Embodiments disclosed herein generally relate to a chamber liner for the high temperature processing of substrates in a processing chamber. The processing chamber utilizes an inert bottom purge flow to shield the substrate support from halogen reactants such that the substrate support may be heated to temperatures greater than about 650 degrees Celsius. The chamber liner controls a flow profile such that during deposition the bottom purge flow restricts reactants and by-products from depositing below the substrate support. During a clean process, the bottom purge flow restricts halogen reactants from contacting the substrate support. As such, the chamber liner includes a conical inner surface angled inwardly to direct purge gases around an edge of the substrate support and to reduce deposition under the substrate support and the on the edge. ## Claims ### Claim 1 A chamber liner, comprising: an annular bottom portion configured to extend underneath a substrate support positioned in a processing chamber and defining an opening in a center region therein underneath the substrate support; and a sidewall portion extending from the annular bottom portion, the sidewall portion having: a first sidewall portion having a first outer diameter, a first inner diameter and a first inner surface; a second sidewall portion having a second outer diameter, wherein the second outer diameter is greater than the first outer diameter, and the first sidewall portion is disposed between the second sidewall portion and the annular bottom portion, the second sidewall portion having a second inner surface configured to define a processing region that is disposed above the substrate support during processing and having a second inner diameter, wherein the second inner diameter is less than the first inner diameter; and a conical inner surface extending between the first inner surface and the second inner surface, wherein the conical inner surface is angled inwardly from the first inner surface to the second inner surface, wherein the sidewall portion is disposed within the processing chamber and spaced apart from inner surfaces of the processing chamber. ### Claim 2 (depends on 1) The chamber liner of claim 1, wherein the annular bottom portion and the sidewall portion each further comprise a material selected from a group of a quartz material, an Al2O3 material, a ceramic coated aluminum material, a stainless steel material, or combinations and mixtures thereof. ### Claim 3 (depends on 1) The chamber liner of claim 1, wherein the sidewall portion further comprises a first outer surface having a notch disposed within the first outer surface. ### Claim 4 (depends on 1) The chamber liner of claim 1, wherein the sidewall portion further comprises a first outer surface and a second outer surface, wherein the second outer surface defines a top surface of the sidewall portion, wherein the top surface of the sidewall portion is angled and extends without interruption from the second inner surface to the first outer surface. ### Claim 5 (depends on 4) The chamber liner of claim 4, wherein the second outer surface is angled without interruption from the first outer surface to the second inner surface. ### Claim 6 (depends on 4) The chamber liner of claim 4, wherein the second outer surface is angled between about 30 degrees and about 75 degrees relative to a horizontal plane defined by the annular bottom portion. ### Claim 7 (depends on 4) The chamber liner of claim 4, wherein the second outer surface is parallel to the conical inner surface of the sidewall portion. ### Claim 8 (depends on 1) The chamber liner of claim 1, wherein the first inner surface and the second inner surface are substantially normal relative to a horizontal plane defined by the annular bottom portion. ### Claim 9 A chamber liner, comprising: an annular bottom portion defining an opening in a center region therein; and a sidewall portion extending from the annular bottom portion, the sidewall portion having: a first inner surface having a first diameter; a second inner surface having a second diameter, wherein the second diameter is less than the first diameter, wherein the first inner surface is disposed between the second inner surface and the annual bottom portion; a conical inner surface extending between the first inner surface and the second inner surface, wherein the conical inner surface is angled inwardly from the first inner surface to the second inner surface at an angle of between about 45 degrees and about 75 degrees relative to a horizontal plane defined by the annular bottom portion; and a first outer surface and a second outer surface, the second outer surface defines a top surface of the sidewall portion, wherein the top surface of the sidewall portion is angled and extends without interruption from the second inner surface to the first outer surface, wherein the sidewall portion is configured to be disposed within a processing chamber and the sidewall portion is spaced apart from inner surfaces of the processing chamber. ### Claim 10 (depends on 9) The chamber liner of claim 9, wherein the annular bottom portion and the sidewall portion each further comprise a material selected from a group of a quartz material, an Al2O3 material, a ceramic coated aluminum material, a stainless steel material, or combinations and mixtures thereof. ### Claim 11 (depends on 9) The chamber liner of claim 9, wherein the sidewall portion further comprises a notch disposed within the first outer surface. ### Claim 12 (depends on 9) The chamber liner of claim 9, wherein the second outer surface is angled downward from the second inner surface to the first outer surface. ### Claim 13 (depends on 12) The chamber liner of claim 12, wherein the second outer surface is angled downward from the second inner surface to the first outer surface at an angle between about 30 degrees and about 75 degrees relative to a horizontal plane defined by the annular bottom portion. ### Claim 14 (depends on 12) The chamber liner of claim 12, wherein the second outer surface is parallel to the conical inner surface of the side wall portion. ### Claim 15 (depends on 12) The chamber liner of claim 12, wherein the first inner surface and the second inner surface are substantially normal relative to a horizontal plane defined by the annular bottom portion. ### Claim 16 A processing chamber, comprising: a chamber body defining a processing volume; a substrate support disposed in the processing volume having a supporting shaft disposed through an opening in a bottom wall of the chamber body; and a liner disposed in the processing volume, the liner comprising: an annular bottom portion having an opening in a center region thereof, wherein the supporting shaft is configured to be positioned within the opening; and a sidewall portion extending from the annular bottom portion, the sidewall portion having: a first inner surface having a first diameter; a second inner surface having a second diameter, wherein the second diameter is less than the first diameter, wherein the first inner surface is disposed between the second inner surface and the annular bottom portion; a conical inner surface extending between the first inner surface and the second inner surface, wherein the conical inner surface is angled inwardly from the first inner surface to the second inner surface; and a first outer surface and a second outer surface, the second outer surface defines a top surface of the sidewall portion, wherein the top surface of the sidewall portion is angled and extends without interruption from the second inner surface to the first outer surface, wherein the sidewall portion is disposed within the processing chamber and spaced apart from inner surfaces of the processing chamber. ### Claim 17 (depends on 16) The processing chamber of claim 16, wherein the annular bottom portion and the sidewall portion each further comprise a material selected from a group of a quartz material, an Al2O3 material, a ceramic coated aluminum material, a stainless steel material, or combinations and mixtures thereof. ### Claim 18 (depends on 16) The processing chamber of claim 16, wherein the conical inner surface is angled between about 45 degrees and about 75 degrees relative to a horizontal plane defined by the annular bottom portion. ### Claim 19 (depends on 16) The processing chamber of claim 16, wherein the second outer surface is angled downward from the second inner surface to the first outer surface.